Process for the reductive amination of halogen-containing substrates

    公开(公告)号:US10544087B2

    公开(公告)日:2020-01-28

    申请号:US16565595

    申请日:2019-09-10

    申请人: Taminco BVBA

    IPC分类号: C07C209/26 A01N37/36

    摘要: Disclosed is a process for performing a reductive amination of a first functional group in an organic feed substrate, which feed substrate comprises at least one further functional group containing a halogen atom, in the presence of hydrogen, a nitrogen-containing compound, and a catalyst, wherein the presence of the nitrogen-containing compound, expressed in a molar ratio relative to the first functional group in the organic feed substrate, at least during the reaction as long as the conversion of the organic feed substrate has not yet reached 80%, is maintained below a level of 1.3. Further disclosed is a composition of the invention comprising at least 98.0% wt of 2-chloro-benzyl-dimethylamine, at most 0.60% wt of the meso-o-Cl-BDMA dimer and at least 1 ppm wt of the (+/−)-o-Cl-BDMA dimer and any use therefor.

    Process for the reductive amination of halogen-containing substrates

    公开(公告)号:US10464879B2

    公开(公告)日:2019-11-05

    申请号:US15344846

    申请日:2016-11-07

    申请人: Taminco BVBA

    摘要: Disclosed is a process for performing a reductive amination of a first functional group in an organic feed substrate, which feed substrate comprises at least one further functional group containing a halogen atom, in the presence of hydrogen, a nitrogen-containing compound, and a catalyst, wherein the presence of the nitrogen-containing compound, expressed in a molar ratio relative to the first functional group in the organic feed substrate, at least during the reaction as long as the conversion of the organic feed substrate has not yet reached 80%, is maintained below a level of 1.3. Further disclosed is a composition of the invention comprising at least 98.0% wt of 2-chloro-benzyl-dimethylamine, at most 0.60% wt of the meso-o-Cl-BDMA dimer and at least 1 ppm wt of the (+/−)-o-Cl-BDMA dimer and any use therefor.

    PROCESS FOR THE REDUCTIVE AMINATION OF HALOGEN-CONTAINING SUBSTRATES

    公开(公告)号:US20170129847A1

    公开(公告)日:2017-05-11

    申请号:US15344846

    申请日:2016-11-07

    申请人: Taminco BVBA

    IPC分类号: C07C209/26 A01N37/36

    摘要: Disclosed is a process for performing a reductive amination of a first functional group in an organic feed substrate, which feed substrate comprises at least one further functional group containing a halogen atom, in the presence of hydrogen, a nitrogen-containing compound, and a catalyst, wherein the presence of the nitrogen-containing compound, expressed in a molar ratio relative to the first functional group in the organic feed substrate, at least during the reaction as long as the conversion of the organic feed substrate has not yet reached 80%, is maintained below a level of 1.3. Further disclosed is a composition of the invention comprising at least 98.0% wt of 2-chloro-benzyl-dimethylamine, at most 0.60% wt of the meso-o-Cl-BDMA dimer and at least 1 ppm wt of the (+/−)-o-Cl-BDMA dimer and any use therefor.