Abrasive molding and abrasive disc provided with same
    4.
    发明授权
    Abrasive molding and abrasive disc provided with same 失效
    磨料成型和研磨盘提供相同的

    公开(公告)号:US06817934B2

    公开(公告)日:2004-11-16

    申请号:US09895391

    申请日:2001-07-02

    IPC分类号: B24D300

    摘要: An abrasive molding consisting essentially of inorganic particles having an average particle diameter in the range of 0.005 &mgr;m to 0.3 &mgr;m, and having a relative density in the range of 45% to 90%, provided that pores having a diameter of at least 0.5 &mgr;m are excluded from the molding. The abrasive molding is used for polishing a material to be polished by using a polishing liquid, preferably water or an aqueous solution of an alkali metal hydroxide, which does not contain a loose abrasive grain.

    摘要翻译: 基本上由平均粒径在0.005μm至0.3μm之间的无机颗粒组成并具有在45%至90%范围内的相对密度的磨料成型体,条件是直径至少为0.5μm的孔为 从成型中排除。 磨料成型用于通过使用不含有松散磨粒的抛光液,优选水或碱金属氢氧化物的水溶液来抛光待抛光材料。