公开(公告)号：US20090061748A1

公开(公告)日：2009-03-05

申请号：US12285936

申请日：2008-10-16

申请人： Tetsuji TOGAWA ,  Ikutarao NOJI ,  Keisuke NAMIKI ,  Hozumi YASUDA ,  Shunichiro KOJIMA ,  Kunihiko SAKURAI ,  Nobuyuki TAKADA ,  Osamu NABEYA ,  Makoto FUKUSHIMA ,  Hideki TAKAYANAGI

发明人： Tetsuji TOGAWA ,  Ikutarao NOJI ,  Keisuke NAMIKI ,  Hozumi YASUDA ,  Shunichiro KOJIMA ,  Kunihiko SAKURAI ,  Nobuyuki TAKADA ,  Osamu NABEYA ,  Makoto FUKUSHIMA ,  Hideki TAKAYANAGI

IPC分类号： B24B41/06

CPC分类号： B24B37/30 ,  B24B41/061

摘要： The present invention relates to a substrate holding apparatus for holding and pressing a substrate against a polishing surface. The substrate holding apparatus includes a top ring body for holding the substrate, an elastic pad for contacting the substrate, and a support member for supporting the elastic pad. The substrate holding apparatus further includes a contact member mounted on a lower surface of the support member and disposed in a space formed by the elastic pad and the support member. The contact member has an elastic membrane for contacting the elastic pad. A first pressure chamber is defined in the contact member, and a second pressure chamber is defined outside of the contact member. The substrate holding apparatus also includes a fluid source for independently supplying a fluid into, or creating a vacuum in, the first pressure chamber and the second pressure chamber.

摘要翻译： 本发明涉及一种用于将基板保持并压靠在抛光表面上的基板保持装置。 基板保持装置包括用于保持基板的顶环体，用于接触基板的弹性垫和用于支撑弹性垫的支撑构件。 基板保持装置还包括安装在支撑构件的下表面上并设置在由弹性垫和支撑构件形成的空间中的接触构件。 接触构件具有用于接触弹性垫的弹性膜。 第一压力室限定在接触构件中，并且第二压力室限定在接触构件的外部。 基板保持装置还包括用于独立地向第一压力室和第二压力室供应流体或产生真空的流体源。