公开(公告)号：US20220230856A1

公开(公告)日：2022-07-21

申请号：US17579643

申请日：2022-01-20

Applicant: Tokyo Electron Limited

Inventor： Ichiro SONE ,  Hideaki NAGASAKI

IPC: H01J37/32 ,  H01J37/18

Abstract: According to an aspect of the present disclosure, there is provided a plasma processing system for performing plasma processing on a substrate, the plasma processing system including: a chamber to which a consumable member is attached inside; a vacuum transfer chamber connected to the chamber; a transfer device provided in the vacuum transfer chamber and configured to transfer the consumable member between the chamber and the transfer device; a measuring instrument provided outside the chamber in the plasma processing system and configured to detect a state of the consumable member; and a controller configured to control each element of the plasma processing system.

公开(公告)号：US20220357146A1

公开(公告)日：2022-11-10

申请号：US17733846

申请日：2022-04-29

Applicant: Tokyo Electron Limited

Inventor： Kenji NAGAI ,  Hideaki NAGASAKI

IPC: G01B9/02055 ,  G01B9/02015

Abstract: A system includes a first optical unit that emits light to a measurement target object and receives first interference light incident from the measurement target object, a second optical unit that emits the light to a reference object configured to have a constant optical path length with respect to a temperature fluctuation and receives second interference light incident from the reference object, a spectroscope connected to the first optical unit and the second optical unit and receives the first interference light and the second interference light to be incident, and a control unit connected to the spectroscope, and the control unit calculates a fluctuation rate of a measurement optical path length with respect to a reference optical path length under a predetermined temperature environment on the basis of the optical path length of the reference object calculated on the basis of the second interference light incident on the spectroscope under the predetermined temperature environment, and the reference optical path length of the reference object acquired in advance, and corrects, on the basis of the fluctuation rate, the optical path length of the measurement target object calculated on the basis of the first interference light incident on the spectroscope under the predetermined temperature environment.