公开(公告)号：US20220251705A1

公开(公告)日：2022-08-11

申请号：US17586002

申请日：2022-01-27

Applicant: Tokyo Electron Limited

Inventor： Kazushi HIKAWA ,  Katsuhito HIROSE

IPC: C23C16/455 ,  C23C16/505 ,  H05H1/46 ,  H01L21/02

Abstract: A substrate processing apparatus includes a radio-frequency power supply part configured to supply radio-frequency power for plasma generation to a processing container, and a monitoring part configured to detect an abnormality in the supply of the radio-frequency power to the processing container, wherein the monitoring part is configured to detect the abnormality in the supply of the radio-frequency power to the processing container based on a signal data obtained by sampling a signal propagating between the radio-frequency power supply part and the processing container at a sampling frequency higher than a frequency of the radio-frequency power.