公开(公告)号：US11669955B2

公开(公告)日：2023-06-06

申请号：US17252151

申请日：2019-06-10

Applicant: Tokyo Electron Limited

Inventor： Shin Inoue ,  Kazuya Hisano ,  Akiko Kiyotomi ,  Tadashi Nishiyama

IPC: G06T7/00 ,  G03F7/16

CPC classification number: G06T7/001 ,  G03F7/162 ,  G06T7/0008 ,  G06T2207/30148

Abstract: Defects of substrates are inspected when executing a job in which a treatment recipe for substrates and the substrates being treatment objects are designated to perform predetermined treatments on the substrates. An imaging step successively images substrates. A first determination step decomposes, in order from the substrate as head of the job, a planar distribution of pixel values in a substrate image captured at the imaging step into pixel value distribution components using a Zernike polynomial, calculates Zernike coefficients of the pixel value distribution components corresponding to defects to be detected, and determines presence or absence of a defect based on the calculated Zernike coefficients. A second determination step determines, from predetermined timing after one or more substrates is determined to have no defect at the first determination step, presence or absence of a defect based on the substrate image determined to have no defect at the first determination step.