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公开(公告)号：US11257662B2
公开(公告)日：2022-02-22
申请号：US16545185
申请日：2019-08-20
Applicant: Tokyo Electron Limited
Inventor： Shingo Kitamura , Koichi Kazama , Masahiro Ogasawara , Susumu Nogami , Tetsuji Sato
IPC: H01J37/32 , H01L21/687 , H01L21/3213
Abstract: An annular member is disposed to surround a pedestal for receiving a substrate in a plasma processing apparatus. The annular member contains quartz and silicon. A content percentage of the silicon in the quartz and the silicon is 2.5% or more and 10% and less by weight.
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