SUBSTRATE SUPPORT PEDESTAL AND PLASMA PROCESSING APPARATUS

    公开(公告)号:US20210104385A1

    公开(公告)日:2021-04-08

    申请号:US17034265

    申请日:2020-09-28

    Abstract: There is provided a substrate support pedestal including: a first metallic member having a recess formed in an upper portion of the first metallic member; a second metallic member provided on the first metallic member and configured to seal the recess; a substrate support part provided on the second metallic member; and one or more thermoelectric elements disposed in the recess, wherein the recess is filled with a heat transfer medium.

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