公开(公告)号：US20240041323A1

公开(公告)日：2024-02-08

申请号：US17882600

申请日：2022-08-08

Applicant: Topcon Corporation

Inventor： Tatsuo YAMAGUCHI ,  Ryo BANDO

IPC: A61B3/14 ,  A61B3/00 ,  G06T7/00

CPC classification number: A61B3/14 ,  A61B3/0008 ,  A61B3/0025 ,  G06T7/0014 ,  G06T2207/30041

Abstract: An ophthalmic apparatus according to an embodiment includes an illumination system configured to project illumination light onto a subject's eye, and a photography system configured to perform photography of the subject's eye. The illumination system and the photography system are configured to satisfy a Scheimpflug condition. The illumination system includes a light source unit configured to output slit illumination light, and an illumination polarizer configured to extract an illumination polarization component from the slit illumination light. The illumination system is further configured to project the illumination polarization component onto the subject's eye. The photography system includes a photography polarizer configured to extract a photography polarization component from return light from the subject's eye with the slit illumination light projected, and an image sensor configured to detect the photography polarization component.