公开(公告)号：US20100051832A1

公开(公告)日：2010-03-04

申请号：US12543582

申请日：2009-08-19

申请人： Toshihiro NISHISAKA ,  Yukio WATANABE ,  Osamu WAKABAYASHI ,  Kouji KAKIZAKI ,  Michio SHINOZAKI

发明人： Toshihiro NISHISAKA ,  Yukio WATANABE ,  Osamu WAKABAYASHI ,  Kouji KAKIZAKI ,  Michio SHINOZAKI

IPC分类号： G21K5/04

CPC分类号： G03F7/70033 ,  G03F7/70975 ,  H05G2/00 ,  H05G2/003 ,  H05G2/008

摘要： An EUV light source apparatus by which detachment of a chamber or a part of the chamber, movement to a maintenance area, and highly accurate placement relative to projection optics can be performed easily for maintenance of the EUV light source apparatus. The EUV light source apparatus is an apparatus for generating plasma by applying a laser beam to a target material within a chamber and entering EUV light radiated from the plasma into projection optics of exposure equipment, and includes a positioning mechanism for positioning the chamber or a maintenance unit of the chamber in a predetermined location where an optical axis of the collected extreme ultraviolet light and an optical axis of the projection optics of the exposure equipment are aligned, and a movement mechanism for moving the chamber or the maintenance unit of the chamber between the predetermined location and a maintenance area.

摘要翻译： EUV光源装置能够容易地进行EUV光源装置的维护，EUV光源装置能够容易地进行腔室或腔室的一部分的移动，到维护区域的移动以及相对于投影光学元件的高精度放置。 EUV光源装置是通过将激光束施加到室内的目标材料并且将从等离子体辐射的EUV光输入到曝光设备的投影光学器件中来产生等离子体的装置，并且包括用于定位腔室或维护的定位机构 在所述收集的极紫外光的光轴和所述曝光设备的投影光学元件的光轴对准的预定位置处的所述室的单元，以及用于将所述室或所述室的维护单元移动到所述室 预定位置和维护区域。

公开(公告)号：US20130075625A1

公开(公告)日：2013-03-28

申请号：US13553621

申请日：2012-07-19

申请人： Takayuki YABU ,  Yoshifumi UENO ,  Junichi FUJIMOTO ,  Yukio WATANABE ,  Toshihiro NISHISAKA

发明人： Takayuki YABU ,  Yoshifumi UENO ,  Junichi FUJIMOTO ,  Yukio WATANABE ,  Toshihiro NISHISAKA

IPC分类号： F23D11/32 ,  G21K5/04

CPC分类号： H05G2/005 ,  H05G2/006 ,  H05G2/008

摘要： A target supply unit includes a nozzle through which a target material is outputted, and a first electrically conductive member having a first opening formed therein and positioned to face the nozzle in a direction into which the target material is outputted through the nozzle. The first electrically conductive member is positioned so that the first opening is located below the nozzle in a gravitational direction. The target supply unit includes a voltage generator which applies a voltage between the target material and the first electrically conductive member.

摘要翻译： 目标供给单元包括：输出目标材料的喷嘴;以及形成有第一开口的第一导电构件，其位于与通过喷嘴输出目标材料的方向相对的喷嘴。 第一导电构件被定位成使得第一开口在重力方向上位于喷嘴下方。 目标供应单元包括在目标材料和第一导电构件之间施加电压的电压发生器。