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    Thin-film magnetic head reliably producing fringing flux at gap layer and method for fabricating the same
    3.
    发明授权
    Thin-film magnetic head reliably producing fringing flux at gap layer and method for fabricating the same 失效
    薄膜磁头可靠地在间隙层产生边缘焊剂及其制造方法

    公开(公告)号：US06751053B2

    公开(公告)日：2004-06-15

    申请号：US09822119

    申请日：2001-03-30

    申请人： Toshinori Watanabe ,  Kiyoshi Sato ,  Kiyoshi Kobayashi ,  Masaki Ikegami

    发明人： Toshinori Watanabe ,  Kiyoshi Sato ,  Kiyoshi Kobayashi ,  Masaki Ikegami

    IPC分类号： G11B5147

    CPC分类号： G11B5/40 ,  G11B5/3106 ,  G11B5/3116 ,  G11B5/312 ,  G11B5/313 ,  G11B5/3133 ,  G11B5/3967

    摘要： A thin-film magnetic head includes a lower core layer, a gap layer, an upper pole layer, and an upper core layer. At the joint between the upper pole layer and the upper core layer, the width of the upper core layer is larger than the width of the upper pole layer, and also the inner end of the upper core layer is located at the back of the inner end of the upper pole layer. Alternatively, a thin-film magnetic head includes a lower core layer, a recording core, an upper core layer, a coil, and a magnetic intermediate layer. The magnetic intermediate layer has a higher saturation flux density than that of the upper core layer. Methods for fabricating thin-film magnetic heads are also disclosed.

    摘要翻译： 薄膜磁头包括下芯层，间隙层，上极层和上芯层。 在上极层和上芯层之间的接合处，上芯层的宽度大于上极层的宽度，并且上芯层的内端也位于内芯层的后部 上极层的末端。 或者，薄膜磁头包括下芯层，记录芯，上芯层，线圈和磁中间层。 磁中间层具有比上芯层更高的饱和磁通密度。 还公开了制造薄膜磁头的方法。

    Thin-film magnetic head appropriately suppressing side fringing and method for fabricating the same
    4.
    发明授权
    Thin-film magnetic head appropriately suppressing side fringing and method for fabricating the same 有权
    适合抑制边缘的薄膜磁头及其制造方法

    公开(公告)号：US07167340B2

    公开(公告)日：2007-01-23

    申请号：US09802314

    申请日：2001-03-08

    申请人： Kiyoshi Sato ,  Toshinori Watanabe ,  Hideki Gochou ,  Kiyoshi Kobayashi ,  Toru Takahashi ,  Hisayuki Yazawa ,  Hiromi Ikegami ,  by Chiaki Ikegami, legal represenative

    发明人： Masaki Ikegami

    IPC分类号： G11B5/31

    CPC分类号： G11B5/3116 ,  G11B5/312 ,  G11B5/313 ,  G11B5/3163

    摘要： A thin-film magnetic head includes a lower core layer; a recording core formed on the lower core layer and exposed at a face surface facing a recording medium, the recording core including a gap layer, an upper pole layer, and optionally, a lower pole layer; an upper core layer magnetically coupled to the upper pole layer; and a coil. A tip surface of the upper core layer at the face surface is set back from the face surface in the height direction, and the tip surface is an inclined surface or a curved surface in which the depth gradually increases from the track width direction. A method for fabricating a thin-film magnetic head is also disclosed.

    摘要翻译： 薄膜磁头包括下芯层; 记录芯，形成在下芯层上并在面向记录介质的表面上暴露，所述记录芯包括间隙层，上极层和可选的下极层; 磁性地耦合到上极层的上芯层; 和线圈。 上表面的上芯层的顶表面在高度方向上从表面返回，并且尖端表面是倾斜表面或深度从轨道宽度方向逐渐增加的曲面。 还公开了一种用于制造薄膜磁头的方法。

    Exposure mask and exposure method using the same
    5.
    发明授权
    Exposure mask and exposure method using the same 失效
    曝光掩模和曝光方法使用相同

    公开(公告)号：US06638670B1

    公开(公告)日：2003-10-28

    申请号：US09664030

    申请日：2000-09-19

    申请人： Toshihiko Sato ,  Jun Iwasaki ,  Masaki Ikegami ,  Masami Kobayashi ,  Masaharu Yokoyama

    发明人： Toshihiko Sato ,  Jun Iwasaki ,  Masaki Ikegami ,  Masami Kobayashi ,  Masaharu Yokoyama

    IPC分类号： G03F900

    CPC分类号： G03F9/00 ,  G11B5/3103 ,  G11B5/313 ,  G11B5/3166 ,  G11B5/3173 ,  G11B5/3903 ,  G11B5/488

    摘要： An exposure mask for exposing a photosensitive resist layer formed on the surface of a substrate having an element so that the resist layer remains in the shape of an ABS pattern includes a mark provided within a light transmission section for exposure. The mark determines a relative position between the substrate and the light transmission section on the basis of the element. An exposure method using the exposure mask includes the steps of: determining a relative position between the substrate and the light transmission section on the basis of the element by the mark provided within the light transmission section of the exposure mask; exposing the photosensitive resist layer on the surface of the substrate through the light transmission section of the exposure mask; and developing the exposed photosensitive resist layer so that the resist layer is left in the shape of the ABS pattern.

    摘要翻译： 一种曝光掩模，用于曝光形成在具有元件的基板的表面上的光敏抗蚀剂层，使得抗蚀剂层保持为ABS图案的形状包括设置在用于曝光的光透射部分内的标记。 该标记基于该元件确定基板和光透射部分之间的相对位置。 使用曝光掩模的曝光方法包括以下步骤：基于所述元件，通过设置在曝光掩模的光透射部分内的标记来确定基板和光透射部分之间的相对位置; 通过曝光掩模的光透射部分使基片的表面上的光敏抗蚀剂层曝光; 并且使曝光的光敏抗蚀剂层显影，使得抗蚀剂层保持为ABS图案的形状。