Cleaning formulation and method of cleaning a surface
    1.
    发明申请
    Cleaning formulation and method of cleaning a surface 有权
    清洁配方和清洁表面的方法

    公开(公告)号:US20040048769A1

    公开(公告)日:2004-03-11

    申请号:US10659309

    申请日:2003-09-11

    CPC classification number: C11D3/364 C11D3/042 C11D3/1266 C11D3/323 C11D17/003

    Abstract: A cleaning formulation comprising a cleaning agent, a particulate clay material and an aqueous carrier. The formulation has a pH less than about 4.0 and is characterized by at least a 90% reduction in viscosity at 25null C. at a shear rate of up to about 0.10 snull1. The cleaning formulation is thixotropic and has a highly desirable combination of acid stability, temperature stability, electrolyte stability and ultraviolet radiation stability.

    Abstract translation: 一种清洁制剂,其包含清洁剂,颗粒状粘土材料和水性载体。 该制剂具有小于约4.0的pH,并且其特征在于在高达约0.10s -1的剪切速率下在25℃下至少降低90%的粘度。 清洗配方是触变性的,具有很好的酸稳定性,温度稳定性,电解液稳定性和紫外线辐射稳定性的组合。

    Cleaning formulation for optical surfaces
    2.
    发明申请
    Cleaning formulation for optical surfaces 审中-公开
    光学表面清洁配方

    公开(公告)号:US20040242451A1

    公开(公告)日:2004-12-02

    申请号:US10648444

    申请日:2003-08-27

    Abstract: A cleaning formulation for removing materials from a surface (e.g., an optical surface, a metal surface and the like), the cleaning formulation comprising from about 0.5 to about 60 weight percent of a compound derived from urea and a phosphorus-containing acid, together with a carrier therefor. A method for removing fouling materials from a surface is also described. The cleaning formulation may be used to remove materials, inter alia, from optical radiation surfaces, optical lens surfaces (e.g., a contact lens) and the like.

    Abstract translation: 用于从表面(例如光学表面,金属表面等)去除材料的清洁配方,所述清洁制剂包含约0.5至约60重量%的衍生自脲和含磷酸的化合物,一起 有一个承运人。 还描述了从表面除去结垢材料的方法。 清洁制剂可以用于除去材料,特别是从光学辐射表面,光学透镜表面(例如隐形眼镜)等去除材料。

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