MASK
    1.
    发明申请
    MASK 审中-公开

    公开(公告)号:US20200340093A1

    公开(公告)日:2020-10-29

    申请号:US16758418

    申请日:2018-10-24

    IPC分类号: C23C14/04 C23C14/24 H01L51/00

    摘要: A mask, including a dummy region and at least one effective evaporation region. The at least one effective evaporation region is provided with several first through holes. The dummy region is provided with several second through holes. The second through hole has a same shape as the first through hole, a dimension of the second through hole is equal to a dimension the first through hole, and spacing between the second through holes is equal to spacing between the first through holes. The second through holes are disposed in the dummy region on the outer side of the effective evaporation region. The second through hole has the same shape, dimension, and spacing as the first through hole.