公开(公告)号：US20150229854A1

公开(公告)日：2015-08-13

申请号：US14684755

申请日：2015-04-13

Applicant: U.S. Army Research Laboratory ATTN: RDRL-LOC-I

Inventor： DAVID H. TOFSTED ,  Sean G. O'Brien

IPC: H04N5/357 ,  G06T5/00

CPC classification number: H04N5/357 ,  G02B26/00 ,  G02B26/06 ,  G03B7/085 ,  G06T5/001 ,  H04N5/2254 ,  H04N5/238

Abstract: A method for image processing comprising providing an opening for entrance of light; the light being capable of being formed into an image; providing at least one optical element in an optical train configured to focus light; providing a variable aperture operatively associated with the at least one optical element; the variable aperture being placed in the optical train at an image plane and comprising mask settings for shielding portions of the light; providing an imager; providing at least one processor operatively connected to the variable aperture and imager; the at least one processor configured to control the passage of the light through the variable aperture; selectively masking portions of light using the mask settings of the variable aperture; obtaining image results using the settings; comparing image results obtained by the mask settings, and determining the phase correction that provides the optimal image results.

Abstract translation: 一种用于图像处理的方法，包括提供用于入射光的开口; 光能够形成图像; 在配置成聚焦光的光学系列中提供至少一个光学元件; 提供与所述至少一个光学元件可操作地相关联的可变光圈; 所述可变孔径被放置在所述光学系统中的图像平面处，并且包括用于屏蔽所述光的部分的掩模设置; 提供一个成像器; 提供可操作地连接到所述可变孔径和成像器的至少一个处理器; 所述至少一个处理器被配置为控制所述光通过所述可变孔径的通过; 使用可变孔径的掩模设置来选择性地掩蔽光的部分; 使用设置获取图像结果; 比较通过掩模设置获得的图像结果，并确定提供最佳图像结果的相位校正。