公开(公告)号：US20210261469A1

公开(公告)日：2021-08-26

申请号：US16798016

申请日：2020-02-21

Applicant: United Technologies Corporation

Inventor： Ying She ,  Nitin Garg ,  Andrew J. Lazur ,  Olivier H. Sudre

IPC: C04B35/80 ,  C04B35/628

Abstract: Disclosed herein is a chemical vapor infiltration method including flowing ceramic precursors through a preform and depositing a matrix material on the preform at a first gas infiltration pressure, increasing the gas filtration pressure to a second gas infiltration pressure, and lowering the gas infiltration pressure to a third gas infiltration pressure which is intermediate to the first and second gas infiltration pressures.