APPARATUS FOR PROVIDING A ROTATION CARRIER MAGAZINE, AND METHOD OF OPERATING THEREOF
    2.
    发明申请
    APPARATUS FOR PROVIDING A ROTATION CARRIER MAGAZINE, AND METHOD OF OPERATING THEREOF 有权
    用于提供旋转载体杂志的装置及其操作方法

    公开(公告)号:US20120099949A1

    公开(公告)日:2012-04-26

    申请号:US12914113

    申请日:2010-10-28

    IPC分类号: H01L21/677

    CPC分类号: H01L21/67769

    摘要: An apparatus for supporting a plurality of carriers or substrates is described. The apparatus includes a vacuum chamber and a rotatable support for supporting the plurality of carriers or substrates, wherein the support is provided within the vacuum chamber and is configured for rotating the supported plurality of carriers or substrates around a rotation axis.

    摘要翻译: 描述了用于支撑多个载体或基底的装置。 该装置包括真空室和用于支撑多个载体或基底的可旋转支撑件,其中所述支撑件设置在所述真空室内并且构造成用于围绕旋转轴线旋转被支撑的多个载体或基底。

    PROCESSING SYSTEM, METHOD FOR PROCESSING A FLEXIBLE SUBSTRATE, AND DEPOSITION APPARATUS

    公开(公告)号:US20190242011A1

    公开(公告)日:2019-08-08

    申请号:US16312122

    申请日:2016-07-01

    IPC分类号: C23C14/54 C23C14/56

    CPC分类号: C23C14/547 C23C14/562

    摘要: According to one aspect of the present disclosure, a processing system for processing a flexible substrate is provided. The processing system includes: a vacuum chamber; a transport system configured to guide the flexible substrate through the vacuum chamber along a substrate transportation path (P), wherein the transport system comprises a first substrate support and a second substrate support arranged at a distance from the first substrate support; and an inspection system for inspecting the flexible substrate. The inspection system includes: a light source configured to direct a light beam through a portion of the flexible substrate between the first substrate support and the second substrate support; and a light detector for detecting the light beam for conducting a transmission measurement of the flexible substrate, wherein at least one of the light source and the light detector is arranged in an environment configured for a second pressure level different from a first pressure level in the vacuum chamber. According to a further aspect, a deposition apparatus is provided. According to a further aspect, a method processing a flexible substrate is provided.