摘要:
A lithographic apparatus is disclosed. The lithographic apparatus includes a radiation source that produces EUV radiation, an illumination system that provides a beam of the EUV radiation produced by the radiation source, and a support structure that supports a patterning structure. The patterning structure is configured to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate support that supports a substrate, and a projection system that projects the patterned beam onto a target portion of the substrate. The radiation source includes a debris-mitigation system that mitigates debris particles which are formed during production of EUV radiation. The debris-mitigation system is configured to provide additional particles for interacting with the debris particles.
摘要:
A system for detecting at least one contamination species in an interior space of a lithographic apparatus, including: at least one monitoring surface configured to be in contact with the interior space, a thermal controller configured to control the temperature of the monitoring surface to at least one detection temperature, and at least one detector configured to detect condensation of the at least one contamination species onto the monitoring surface.
摘要:
A lithographic apparatus is disclosed. The apparatus includes a projection system configured to project a first radiation beam onto a target portion of a substrate, and at least one monitoring device for detecting contamination in a interior space. The monitoring device includes at least one dummy element having at least one contamination receiving surface. In an aspect of the invention, there is provided at least one dummy element which does not take part in transferring a radiation beam onto a target portion of a substrate, wherein it is monitored whether a contamination receiving surface of the dummy element has been contaminated.
摘要:
The invention relates to a composition for protecting an agricultural crop against external threats, such as weeds, pathogens, abiotic and biotic stresses and/or for improving the quality of the products produced by the crop, which composition comprises one or more poly-phenols and one or more other active ingredients. The other active ingredients may be natural crop protection compounds, metals, acids, all three optionally combined with each other and/or chemical. antimicrobial agents, or may be small particles of organic material, in particular of fibrous organic material, compounds that induce stress tolerance, compounds that stimulate wound repair and growth, or cellulose containing materials.