Lithographic apparatus and radiation source comprising a debris-mitigation system and method for mitigating debris particles in a lithographic apparatus
    1.
    发明申请
    Lithographic apparatus and radiation source comprising a debris-mitigation system and method for mitigating debris particles in a lithographic apparatus 有权
    光刻设备和辐射源包括用于减轻光刻设备中的碎屑颗粒的碎片减轻系统和方法

    公开(公告)号:US20050139785A1

    公开(公告)日:2005-06-30

    申请号:US10747613

    申请日:2003-12-30

    IPC分类号: G03F7/20

    CPC分类号: G03F7/70908 G03F7/70916

    摘要: A lithographic apparatus is disclosed. The lithographic apparatus includes a radiation source that produces EUV radiation, an illumination system that provides a beam of the EUV radiation produced by the radiation source, and a support structure that supports a patterning structure. The patterning structure is configured to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate support that supports a substrate, and a projection system that projects the patterned beam onto a target portion of the substrate. The radiation source includes a debris-mitigation system that mitigates debris particles which are formed during production of EUV radiation. The debris-mitigation system is configured to provide additional particles for interacting with the debris particles.

    摘要翻译: 公开了一种光刻设备。 光刻设备包括产生EUV辐射的辐射源,提供由辐射源产生的EUV辐射束的照明系统和支持图案形成结构的支撑结构。 图案形成结构被配置为在其横截面中赋予辐射束图案。 该装置还包括支撑基板的基板支撑件和将图案化的光束投影到基板的目标部分上的投影系统。 辐射源包括减轻在生成EUV辐射期间形成的碎片颗粒的碎片减轻系统。 碎片减轻系统被配置为提供用于与碎屑颗粒相互作用的附加颗粒。

    Lithographic apparatus having a monitoring device for detecting contamination
    3.
    发明申请
    Lithographic apparatus having a monitoring device for detecting contamination 失效
    具有用于检测污染物的监测装置的平版印刷设备

    公开(公告)号:US20070138414A1

    公开(公告)日:2007-06-21

    申请号:US11311624

    申请日:2005-12-20

    IPC分类号: G01J3/10

    摘要: A lithographic apparatus is disclosed. The apparatus includes a projection system configured to project a first radiation beam onto a target portion of a substrate, and at least one monitoring device for detecting contamination in a interior space. The monitoring device includes at least one dummy element having at least one contamination receiving surface. In an aspect of the invention, there is provided at least one dummy element which does not take part in transferring a radiation beam onto a target portion of a substrate, wherein it is monitored whether a contamination receiving surface of the dummy element has been contaminated.

    摘要翻译: 公开了一种光刻设备。 该装置包括被配置为将第一辐射束投射到基板的目标部分上的投影系统,以及用于检测内部空间中的污染的至少一个监视装置。 监测装置包括至少一个具有至少一个污染物接收表面的虚拟元件。 在本发明的一个方面中,提供了至少一个虚拟元件,其不参与将辐射束传送到基板的目标部分上,其中监视虚设元件的污染物接收表面是否已被污染。