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公开(公告)号:US11409142B2
公开(公告)日:2022-08-09
申请号:US16295879
申请日:2019-03-07
摘要: Metallic and dielectric domains in phase change materials (PCM) provide spatially localized changes in the local dielectric environment, enabling launching, reflection, and transmission of hyperbolic polaritons (HPs) at the PCM domain boundaries, and tuning the wavelength of HPs propagating in hyperbolic materials over these domains, providing a methodology for realizing planar, sub-diffractive refractive optics. This approach offers reconfigurable control of in-plane HP propagation to provide design optical functionality because the phase change material can be manipulated by changing the local structure, for example, to manipulate polaritons in the adjacent hyperbolic material, thus tuning the wave propagation properties of the polaritons in the hyperbolic material.
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公开(公告)号:US20190278112A1
公开(公告)日:2019-09-12
申请号:US16295879
申请日:2019-03-07
摘要: Metallic and dielectric domains in phase change materials (PCM) provide spatially localized changes in the local dielectric environment, enabling launching, reflection, and transmission of hyperbolic polaritons (HPs) at the PCM domain boundaries, and tuning the wavelength of HPs propagating in hyperbolic materials over these domains, providing a methodology for realizing planar, sub-diffractive refractive optics. This approach offers reconfigurable control of in-plane HP propagation to provide design optical functionality because the phase change material can be manipulated by changing the local structure, for example, to manipulate polaritons in the adjacent hyperbolic material, thus tuning the wave propagation properties of the polaritons in the hyperbolic material.
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公开(公告)号:US20230204986A1
公开(公告)日:2023-06-29
申请号:US18071688
申请日:2022-11-30
CPC分类号: G02F1/0018 , G02F1/0305
摘要: A metasurface for propagating phonon polaritons includes correlated oxide on a substrate and a wiring pattern of predetermined geometric shape on the surface thereof. There is a flake of van der Waals phononic exfoliable material on top of the wiring pattern/region. The wiring pattern may be formed by c-AFM or any other appropriate methods.
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