公开(公告)号：US20220068700A1

公开(公告)日：2022-03-03

申请号：US17458768

申请日：2021-08-27

申请人： Veeco Instruments, Inc.

发明人： Alexander Gurary ,  Sandeep Krishnan ,  Aniruddha Bagchi ,  Yuliy Rashkovsky ,  Siddharth Patel

IPC分类号： H01L21/687 ,  C23C16/458 ,  C30B25/12

摘要： A substrate reactor with centering pin for epitaxial deposition includes a vacuum chamber and a tube configured to rotate in the vacuum chamber around a tube geometrical center axis. A substrate carrier forming a pocket dimensioned for holding a substrate on a top surface includes an aperture that is centrally located on a bottom surface. The substrate carrier is positioned on and in contact with a top surface of the tube. A centering pin is positioned along a geometrical center axis of rotation of the substrate carrier. The centering pin has a first end positioned in the aperture on the bottom surface of the substrate carrier and a second end fixed inside the reactor so that the substrate carrier rotates around the geometrical center axis of the substrate carrier independent of the geometrical center axis of the tube.