公开(公告)号：US20160131584A1

公开(公告)日：2016-05-12

申请号：US14899147

申请日：2014-06-17

Applicant: WACKER CHEMIE AG

Inventor： Thorsten GOEBEL ,  Walter HAECKL ,  Wolfgang MUENZER ,  Uwe PAETZOLD ,  Natalia SOFINA

IPC: G01N21/65 ,  G01N21/3504 ,  C01B33/107 ,  G01N30/14

CPC classification number: G01N21/65 ,  B01D53/685 ,  B01D2251/304 ,  B01D2251/60 ,  B01D2253/112 ,  B01D2257/204 ,  B01D2257/2045 ,  B01D2258/02 ,  C01B33/10742 ,  C01B33/10763 ,  G01N21/3504 ,  G01N30/14 ,  G01N30/86 ,  G01N2201/06113 ,  G01N2201/08

Abstract: The composition of a gas or gas stream containing AlCl3 in a chemical reactor is measured by removing AlCl3 from the gas and analyzing the gas by gas chromatography or spectroscopy. Chlorosilanes may be prepared in a fluidized bed reactor having a reactor height H0, in which supplied HCl reacts with silicon, wherein a temperature profile in the fluidized bed reactor is greater than S1(H/H0)=(a1−b1)*(1/(1+exp(−c1((H/H0)−d1))))+b1 and less than S2(H/H0)=(a2−b2)*(1/(1+exp(−c2((H/H0)−d2))))+b2, where a1=100° C., a2=300° C., b1=300° C., b2=400° C., c1=50, c2=20, d1=0.2, and d2=0.8.

Abstract translation: 通过从气体中除去AlCl 3并通过气相色谱或光谱法分析气体来测量在化学反应器中含有AlCl 3的气体或气流的组成。 氯硅烷可以在具有反应器高度H 0的流化床反应器中制备，其中所提供的HCl与硅反应，其中流化床反应器中的温度分布大于S1（H / H0）=（a1-b1）*（1 /（1 + exp（-c1（（H / H0）-d1））））+ b1且小于S2（H / H0）=（a2-b2）*（1 /（1 + exp（-c2 H = H 2）-d 2））））+ b2，其中a1 = 100℃，a2 = 300℃，b1 = 300℃，b2 = 400℃，c1 = 50，c2 = d1 = 0.2，d2 = 0.8。