专利检索 ap:("WONIK QNC Corporation") AND inv:"Sanghyun Cho" 第 1 页

1.

发明授权
Processing method for fluorination of fluorination-target component for semiconductor fabrication equipment, which minimizes generation of contaminant particles, and fluorinated component obtained thereby 有权

公开(公告)号：US11898254B2

公开(公告)日：2024-02-13

申请号：US17965802

申请日：2022-10-14

申请人： WONIK QNC Corporation

发明人： Yoonjae Yu , Seungyoung Oh , Eunyoung Choi , Joohee Jang , Soyoung Choi , Sanghyun Cho

IPC分类号： C23C8/36 , C23C8/06

CPC分类号： C23C8/36 , C23C8/06

摘要： Disclosed are a processing method for fluorination of a fluorination-target component for semiconductor fabrication equipment, which may realize high density and high strength by fluorinating the fluorination-target component using a fluorinating gas excited into plasma, and at the same time, may significantly reduce plasma contaminant particles which are generated during formation of a fluoride coating, and a fluorinated component obtained by the method.