Magnetron sputtering target and cathode assembly
    1.
    发明授权
    Magnetron sputtering target and cathode assembly 失效
    磁控溅射靶和阴极组件

    公开(公告)号:US4198283A

    公开(公告)日:1980-04-15

    申请号:US957698

    申请日:1978-11-06

    IPC分类号: H01J37/34 C23C15/00

    摘要: A magnetron cathode assembly for use in a cathode sputtering apparatus includes a support means for a rectangular frame-like annular target and spaced apart inner and outer pole pieces fastened to the support member and providing a rectangular annular channel for mounting the target in electrically and thermally conductive contact with the support means. Preferably, the target is a set of four straight bars shaped at the ends to assemble together as a rectangular frame. Target bars having a symmetrical hourglass cross section with overhanging flanged side portions adjacent to front and rear faces are adapted to be reversibly clamped to the support means by the inner and outer poles for simple and rapid replacement in the field, said hourglass shape providing maximum utilization of target material.

    摘要翻译: 用于阴极溅射装置的磁控管阴极组件包括用于矩形框状环状靶的支撑装置和紧固到支撑构件的间隔开的内极和外极片,并提供矩形环形通道,用于将电极和热安装 与支撑装置导电接触。 优选地,目标是在端部处成形为四个直杆的组合,以将其组装成矩形框架。 具有对称沙漏横截面的目标杆具有与前后表面相邻的凸出的凸缘侧部分,适于通过内外极杆可逆地夹紧到支撑装置上,以便在现场进行简单和快速的更换,所述沙漏形状提供最大的利用率 的目标材料。