Hypochlorous acid preparation with organic acids

    公开(公告)号:US10029917B2

    公开(公告)日:2018-07-24

    申请号:US15350906

    申请日:2016-11-14

    Abstract: The invention generally relates to compositions of hypochlorous acid (HOCl) and methods of manufacture thereof. In certain aspects, the invention provides air-free compositions of HOCl. In other aspects, the invention provides methods of making HOCl that involve mixing together in water in an air-free environment, a compound that generates a proton (H+) in water and a compound that generates a hypochlorite anion (OCl−) in water to thereby produce air-free hypochlorous acid.

    COMPOSITIONS OF HYPOCHLOROUS ACID AND METHODS OF MANUFACTURE THEREOF

    公开(公告)号:US20230065525A1

    公开(公告)日:2023-03-02

    申请号:US17982116

    申请日:2022-11-07

    Abstract: The invention generally relates to compositions of hypochlorous acid (HOCl) and methods of manufacture thereof. In certain aspects, the invention provides air-free compositions of HOCl. In other aspects, the invention provides methods of making HOCl that involve mixing together in water in an air-free environment, a compound that generates a proton (H+) in water and a compound that generates a hypochlorite anion (OCl−) in water to thereby produce air-free hypochlorous acid.

    COMPOSITIONS OF HYPOCHLOROUS ACID AND METHODS OF MANUFACTURE THEREOF

    公开(公告)号:US20200239307A1

    公开(公告)日:2020-07-30

    申请号:US16795000

    申请日:2020-02-19

    Abstract: The invention generally relates to compositions of hypochlorous acid (HOCl) and methods of manufacture thereof. In certain aspects, the invention provides air-free compositions of HOCl. In other aspects, the invention provides methods of making HOCl that involve mixing together in water in an air-free environment, a compound that generates a proton (H+) in water and a compound that generates a hypochlorite anion (OCl−) in water to thereby produce air-free hypochlorous acid.

    Compositions of hypochlorous acid (HOCI) and methods of manufacture thereof
    6.
    发明授权
    Compositions of hypochlorous acid (HOCI) and methods of manufacture thereof 有权
    次氯酸(HOCI)的组成及其制造方法

    公开(公告)号:US09492479B2

    公开(公告)日:2016-11-15

    申请号:US13770738

    申请日:2013-02-19

    CPC classification number: C01B11/04 A61K31/19 A61K33/20

    Abstract: The invention generally relates to compositions of hypochlorous acid (HOCl) and methods of manufacture thereof. In certain aspects, the invention provides air-free compositions of HOCl. In other aspects, the invention provides methods of making HOCl that involve mixing together in water in an air-free environment, a compound that generates a proton (H+) in water and a compound that generates a hypochlorite anion (OCl−) in water to thereby produce air-free hypochlorous acid.

    Abstract translation: 本发明一般涉及次氯酸(HOCl)的组合物及其制造方法。 在某些方面,本发明提供无空气组合物的HOCl。 在其它方面,本发明提供了制造HOCl的方法,其涉及在无空气环境中的水中混合在一起,在水中产生质子(H +)的化合物和在水中产生次氯酸根阴离子(OCl-)的化合物, 从而产生无空气的次氯酸。

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