METHOD OF INSPECTING A MASK AND APPARATUS FOR PERFORMING THE SAME
    1.
    发明申请
    METHOD OF INSPECTING A MASK AND APPARATUS FOR PERFORMING THE SAME 审中-公开
    检查掩模的方法和执行该掩码的装置

    公开(公告)号:US20130038716A1

    公开(公告)日:2013-02-14

    申请号:US13552169

    申请日:2012-07-18

    IPC分类号: G01N21/956 H04N7/18

    CPC分类号: G01N21/956 G01N2021/95676

    摘要: In a method of inspecting a mask, an image of a first die in a corrected mask may be obtained. The corrected mask may be corrected using correction data that may include deformation factors related to an exposure process. The first image may be reversely corrected based on correction data. The reversely corrected first image may be compared with a reference image to determine whether the first die may be properly implemented or not.

    摘要翻译: 在检查掩模的方法中,可以获得校正掩模中的第一管芯的图像。 可以使用可以包括与曝光处理相关的变形因子的校正数据来校正校正的掩模。 可以基于校正数据反向校正第一图像。 可以将反向校正的第一图像与参考图像进行比较,以确定第一裸片是否可以被适当地实现。