公开(公告)号：US20130236721A1

公开(公告)日：2013-09-12

申请号：US13874870

申请日：2013-05-01

Applicant: XEROX CORPORATION

Inventor： Kock-Yee Law

IPC: G03G15/16

CPC classification number: G03G15/162 ,  B82Y30/00 ,  G03G2215/1623 ,  Y10T428/25 ,  Y10T428/269 ,  Y10T428/3154 ,  Y10T428/31544

Abstract: A xerographic transfer member includes a resistive, electrically relaxable, polyimide substrate, and a conformance resistive layer that includes a fluoroelastomer composite. The fluoroelastomer composite includes a cross-linked fluoropolymer, a plurality of carbon nanotubes, and exhibits a resistivity from about 107 ohm-cm to about 1013 ohm-cm.

Abstract translation: 静电复印转印构件包括电阻，电可松弛的聚酰亚胺衬底和包含含氟弹性体复合材料的一致性电阻层。 含氟弹性体复合材料包括交联的氟聚合物，多个碳纳米管，并且具有约107ohm-cm至约1013ohm-cm的电阻率。

公开(公告)号：US20140349071A1

公开(公告)日：2014-11-27

申请号：US14455554

申请日：2014-08-08

Applicant: XEROX CORPORATION

Inventor： Yuanjia Zhang ,  Kyoo-Chul Park ,  Hong Zhao ,  Kock-Yee Law

IPC: B41J2/165 ,  B41J2/14

CPC classification number: B41J2/165 ,  B41J2/14 ,  B41J2/1606 ,  B41J2/162 ,  B41J2/1628 ,  B41J2/1629 ,  B41J2/1631 ,  B41J2/1642 ,  B41J2/1645 ,  B41J2/1646 ,  G03F7/0035 ,  G03F7/40 ,  Y10T428/24364

Abstract: A device and method for preparing a device having a superoleophobic surface are disclosed. The method includes providing a substrate; coating a lift-off resist layer on the substrate; baking the lift-off resist layer; layering a photoresist layer on the lift-off resist layer; performing photolithography to create a textured pattern in the photoresist layer and the lift-off resist layer, and chemically modifying the textured pattern to create a superoleophobic surface.

Abstract translation: 公开了一种用于制备具有超疏油表面的装置的装置和方法。 该方法包括提供基板; 在基板上涂覆剥离抗蚀剂层; 烘烤剥离抗蚀剂层; 在剥离抗蚀剂层上分层光致抗蚀剂层; 执行光刻以在光致抗蚀剂层和剥离抗蚀剂层中产生纹理图案，以及化学改性纹理图案以产生超疏油表面。