Nano-lithography using squeezed atomic and molecular states
    1.
    发明申请
    Nano-lithography using squeezed atomic and molecular states 失效
    使用挤压的原子和分子态进行纳米光刻

    公开(公告)号:US20030152841A1

    公开(公告)日:2003-08-14

    申请号:US10161541

    申请日:2002-06-03

    Inventor: Eliyahu Averbukh

    Abstract: A method and apparatus for performing atomic and molecular nano-deposition by means of atomic or molecular focusing through a plurality of optical standing waves. A stacked set of standing light waves, preferably arranged as gratings in a predetermined form and of predetermined intensities, is used to sequentially compress or squeeze the width of the incident atomic or molecular beam into ultra-narrow, spatially localized spots or lines. The result is a focused beam of particles with improved resolution compared with prior art atomic focusing. Furthermore, spherical and chromatic aberrational effects can be reduced.

    Abstract translation: 一种通过原子或分子聚焦通过多个光学驻波进行原子和分子纳米沉积的方法和装置。 使用堆叠的一组常规光波,优选地以预定形式布置为预定形式的光栅并且预定强度,以将入射的原子或分子束的宽度顺序地压缩或挤压成超狭窄的空间局部化的斑点或线。 结果是与现有技术的原子聚焦相比,聚焦的粒子束具有改进的分辨率。 此外,可以减少球面和色差效应。

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