Pattern generation device
    1.
    发明授权

    公开(公告)号:US11256011B2

    公开(公告)日:2022-02-22

    申请号:US16402665

    申请日:2019-05-03

    Abstract: One embodiment of the invention provides a pattern generation device includes a light source, a first HPDLC cell, and a second HPDLC cell. The first HPDLC cell is disposed downstream of a light path of the light source and contains a first phase modulation pattern. The second HPDLC cell is disposed downstream of the light path of the first HPDLC cell and contains a diffraction grating pattern.

    Pattern generation device
    2.
    发明授权

    公开(公告)号:US11287712B2

    公开(公告)日:2022-03-29

    申请号:US16402690

    申请日:2019-05-03

    Inventor: Yuan-Yu Lee

    Abstract: One embodiment of the invention provides a pattern generation device includes a light source, a first HPDLC cell, and a second HPDLC cell. The first HPDLC cell is disposed downstream of a light path of the light source and contains a first phase modulation pattern. The second HPDLC cell is disposed downstream of a light path of the first HPDLC cell and contains a second phase modulation pattern.

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