FABRICATION OF HOLLOW NANONEEDLES
    2.
    发明申请
    FABRICATION OF HOLLOW NANONEEDLES 审中-公开
    中空纳米线的制造

    公开(公告)号:US20120171755A1

    公开(公告)日:2012-07-05

    申请号:US13338831

    申请日:2011-12-28

    申请人: Elad Peer Uri Sivan

    发明人: Elad Peer Uri Sivan

    IPC分类号: C12M1/00

    CPC分类号: C12M35/00

    摘要: The present invention provides a method of fabricating a device having hollow nanoneedles which extend through a supporting membrane. The device can be used as a molecular delivery system.5

    摘要翻译: 本发明提供一种制造延伸穿过支撑膜的中空纳米针的装置的方法。 该装置可用作分子递送系统。 5