公开(公告)号：US20120180557A1

公开(公告)日：2012-07-19

申请号：US13006249

申请日：2011-01-13

申请人： Yoshinori Nakano ,  Satoshi Mayumi ,  Kenichiro Miyasato ,  Takashi Yoshizawa ,  Yutaka Miyajima

发明人： Yoshinori Nakano ,  Satoshi Mayumi ,  Kenichiro Miyasato ,  Takashi Yoshizawa ,  Yutaka Miyajima

IPC分类号： G01B5/28

CPC分类号： G01B5/061 ,  G01B5/28

摘要： The present invention relates to an apparatus 1 that processes a surface of a substrate 9 to be processed. A processing module 3 is disposed so as to oppose the substrate 9. The processing module 3 is relatively moved with respect to the substrate 9 in a direction of movement parallel to a plane PL. A foreign matter on the surface of the substrate 9 or a raised portion of the surface is detected by the detection mechanism 10. A roller 12, preferably having a circular cylindrical configuration, of the detection mechanism 10 is disposed in the processing module 3. A rotation axis 12a of the roller 12 is parallel to the plane PL and intersects the direction of movement. The roller 12 is supported by a supporter 13 such that the roller 12 can be rotated about the rotation axis 12a. The rotation axis 12a is adapted to be displaceable in a direction intersecting the plane PL. Rotation of the roller 12 is detected by a rotation sensor 21.

摘要翻译： 本发明涉及对被处理基板9的表面进行处理的装置1。 处理模块3设置成与基板9相对。处理模块3相对于基板9在平行于平面PL的移动方向上相对移动。 通过检测机构10检测基板9的表面的异物或表面的隆起部分。检测机构10的优选具有圆筒形构造的辊12设置在处理模块3中。 辊12的旋转轴线12a平行于平面PL并与运动方向相交。 辊12由支撑件13支撑，使得辊12可以围绕旋转轴线12a旋转。 旋转轴12a适于在与平面PL交叉的方向上移动。 辊12的旋转由旋转传感器21检测。