公开(公告)号：US20120159405A1

公开(公告)日：2012-06-21

申请号：US13240732

申请日：2011-09-22

申请人： Young-keun YOON ,  Hee-bom Kim ,  Myoung-soo Lee ,  Chan-uk Jeon ,  Hak-seung Han

发明人： Young-keun YOON ,  Hee-bom Kim ,  Myoung-soo Lee ,  Chan-uk Jeon ,  Hak-seung Han

IPC分类号： G06F17/50

CPC分类号： G03F1/70

摘要： A method of forming a photomask using a calibration pattern that may exactly transfer a desired pattern to a substrate. The method includes providing one-dimensional calibration design patterns each having first design measures and providing two-dimensional calibration design patterns each having second design measures; obtaining one-dimensional calibration measured patterns using the one-dimensional calibration design patterns and obtaining two-dimensional calibration measured patterns using the two-dimensional calibration design patterns; obtaining first measured measures of the one-dimensional calibration measured patterns and obtaining second measured measures of the two-dimensional calibration measured patterns; establishing a correlation between the first measured measures and the second measured measures; and converting a main measured measure of a main pattern into a corresponding one of the first measured measures using the correlation.

摘要翻译： 使用可以将期望图案精确地转印到基板的校准图案形成光掩模的方法。 该方法包括提供一维校准设计图案，每个具有第一设计措施并提供每个具有第二设计措施的二维校准设计图案; 使用一维校准设计图案获得一维校准测量图案，并使用二维校准设计图案获得二维校准测量图案; 获得一维校准测量图案的第一测量度量，并获得二维校准测量图案的第二测量度量; 建立第一测量措施与第二测量措施之间的相关性; 以及使用所述相关性将主模式的主测量度量转换为相应的第一测量度量。