公开(公告)号：US20210049242A1

公开(公告)日：2021-02-18

申请号：US16539809

申请日：2019-08-13

Applicant: international Business Machines Corporation

Inventor： Scott Halle ,  Derren Dunn ,  Nelson Felix ,  Dhiraj Gupta

IPC: G06F17/50

Abstract: Techniques for semiconductor process flow disposition optimization using clamped Monte Carlo distribution are provided. In one aspect, a method for optimizing a semiconductor fabrication process includes: providing a model of the fabrication process; identifying sensitive parameters of the fabrication process using Monte Carlo simulations that sample sections of experimental parameter populations from the fabrication process as input to the model to determine parameters which impact an outcome of the Monte Carlo simulations, wherein the parameters which impact the outcome of the Monte Carlo simulations are the sensitive parameters; bounding the experimental parameter populations of the sensitive parameters to improve the outcome of the Monte Carlo simulations; and modifying the fabrication process based on the providing, identifying and bounding steps to improve an output of the fabrication process.