Ozone-assisted bi-layer lift-off stencil for narrow track CPP-GMR heads
    1.
    发明申请
    Ozone-assisted bi-layer lift-off stencil for narrow track CPP-GMR heads 失效
    用于窄轨CPP-GMR头的臭氧辅助双层剥离模板

    公开(公告)号:US20050233258A1

    公开(公告)日:2005-10-20

    申请号:US10827949

    申请日:2004-04-20

    IPC分类号: G03F7/00 G11B5/31

    CPC分类号: G11B5/3163

    摘要: A method for forming a bi-layer lift-off mask for use in fabricating GMR read-head sensors with trackwidths of less than 0.1 microns. The mask layers are formed symmetrically on each other, each layer of the mask having a novel dog-bone shape and the lower mask layer being substantially undercut relative to the upper mask layer. The central portion of the lower mask layer forms a narrow ridge that maintains the upper mask layer at a fixed height above a substrate, thereby avoiding problems associated with bi-layer lift-off masks of the prior art. The method of forming the lower ridge requires a carefully controlled undercutting of the lower mask layer, which is accomplished by using an ozone-assisted oxidation process.

    摘要翻译: 一种形成用于制造轨道宽度小于0.1微米的GMR读取头传感器的双层剥离掩模的方法。 掩模层彼此对称地形成,每个掩模层具有新的狗骨形状,并且下掩模层相对于上掩模层基本上是底切的。 下掩模层的中心部分形成窄的脊,其将上掩模层保持在衬底上方的固定高度,从而避免了与现有技术的双层剥离掩模相关的问题。 形成下脊的方法需要仔细控制下掩模层的底切,这是通过使用臭氧辅助氧化工艺来实现的。