公开(公告)号：US06877250B2

公开(公告)日：2005-04-12

申请号：US10316218

申请日：2002-12-10

申请人： Ernst Hendrik August Granneman ,  Vladimir Ivanovich Kuznetsov ,  Gert Jan Snijders

发明人： Ernst Hendrik August Granneman ,  Vladimir Ivanovich Kuznetsov ,  Gert Jan Snijders

IPC分类号： H01L21/00 ,  H01L21/687 ,  F26B7/00 ,  B65B49/07

CPC分类号： H01L21/68764 ,  H01L21/67103 ,  H01L21/67109 ,  H01L21/67115 ,  H01L21/68771 ,  Y10S414/135 ,  Y10S414/141

摘要： In an apparatus for a treatment of a wafer at elevated temperatures, the wafer is taken out of the reactor after heat treatment with the help of a mechanical transport apparatus which preferably grips the wafer around the circumference and on the under side. The transport apparatus includes a wafer surrounding ring. The wafer is placed in a floating wafer reactor where it is cooled in a controlled manner. Transport for further action or treatment then takes place.

摘要翻译： 在用于在升高的温度下处理晶片的装置中，借助于优选地将晶片围绕圆周和下侧夹持的机械输送装置，将晶片热处理后从反应器中取出。 输送装置包括晶圆周围环。 将晶片放置在浮置晶片反应器中，在其中以受控的方式冷却晶片。 然后进行进一步行动或治疗的运输。