公开(公告)号：US06304630B1

公开(公告)日：2001-10-16

申请号：US09713878

申请日：2000-11-16

申请人： Theodorus Hubertus Josephus Bisschops ,  Joseph Johannes Antonius Maria Vrakking ,  Mark Theo Meuwese

发明人： Theodorus Hubertus Josephus Bisschops ,  Joseph Johannes Antonius Maria Vrakking ,  Mark Theo Meuwese

IPC分类号： H05H128

CPC分类号： H05G2/003 ,  G03F7/70033 ,  H05G2/008

摘要： A method is described for generating EUV radiation, comprising the steps of: generating a flow (35) of liquid droplets (39); injecting the flow into a source space (33) connected to a vacuum pump (34), and successively irradiating individual droplets (39) with an intense, pulsed, laser beam (41) focused on a droplet, thus creating a plasma (47) which emits EUV radiation. In order to prevent that liquid vapor destroys the vacuum in the source space (33) and to guarantee a continuous flux of EUV radiation, the flow (35) is guided through additional vacuum spaces (53, 56, 63) in series with the source space. Also described are an EUV radiation source unit for realizing the method and the application of the method in the manufacture of devices, like IC devices, and in a lithographic projection apparatus.

摘要翻译： 描述了一种用于产生EUV辐射的方法，包括以下步骤：产生液滴（39）的流（35）;将流注入连接到真空泵（34）的源空间（33）中，并逐渐照射各个液滴 （39）具有聚焦在液滴上的强烈的脉冲激光束（41），从而产生发射EUV辐射的等离子体（47）。 为了防止液体蒸气破坏源空间（33）中的真空并且保证持续的EUV辐射通量，流（35）被引导通过与源串联的附加真空空间（53,56,63） 空间。 还描述了一种EUV辐射源单元，用于实现在诸如IC器件的器件的制造中的方法和应用，并且在光刻投影设备中。