公开(公告)号：WO2019195522A2

公开(公告)日：2019-10-10

申请号：PCT/US2019/025739

申请日：2019-04-04

Applicant: INPRIA CORPORATION

Inventor： CARDINEAU, Brian, J. ,  EARLEY, William ,  MEYERS, Stephen, T. ,  JIANG, Kai ,  ANDERSON, Jeremy, T.

IPC: C07F7/22

Abstract: Patterning compositions are described based on organo tin dodecamers with hydrocarbyl ligands, oxo ligands, hydroxo ligands and carboxylato ligands. Alternative dodecamer embodiments have organo tin ligands in place of hydrocarbyl ligands. The organo tin ligands can be incorporated into the dodecamers from a monomer with the structure (RCC) 3 SnQ, where R is a hydrocarbyl group and Q is a alkyl tin moiety with a carbon bonded to the Sn atom of the monomer and with a Sn bonded as a replacement of a quaternary carbon atom with bonds to 4 carbon atoms. Some or all of the carboxylato and hydroxyl ligands can be replaced with fluoride ions. Good EUV patterning results are obtained with the dodecamer based patterning compositions.

公开(公告)号：WO2019195522A3

公开(公告)日：2019-10-10

申请号：PCT/US2019/025739

申请日：2019-04-04

Applicant: INPRIA CORPORATION

Inventor： CARDINEAU, Brian, J. ,  EARLEY, William ,  MEYERS, Stephen, T. ,  JIANG, Kai ,  ANDERSON, Jeremy, T.

IPC: C07F7/22 ,  G03F7/004

Abstract: Patterning compositions are described based on organo tin dodecamers with hydrocarbyl ligands, oxo ligands, hydroxo ligands and carboxylato ligands. Alternative dodecamer embodiments have organo tin ligands in place of hydrocarbyl ligands. The organo tin ligands can be incorporated into the dodecamers from a monomer with the structure (RCC) 3 SnQ, where R is a hydrocarbyl group and Q is a alkyl tin moiety with a carbon bonded to the Sn atom of the monomer and with a Sn bonded as a replacement of a quaternary carbon atom with bonds to 4 carbon atoms. Some or all of the carboxylato and hydroxyl ligands can be replaced with fluoride ions. Good EUV patterning results are obtained with the dodecamer based patterning compositions.

公开(公告)号：WO2017066319A3

公开(公告)日：2017-04-20

申请号：PCT/US2016/056637

申请日：2016-10-12

Applicant: INPRIA CORPORATION

Inventor： MEYERS, Stephen, T. ,  ANDERSON, Jeremy, T. ,  CARDINEAU, Brian, J. ,  EDSON, Joseph, B. ,  JIANG, Kai ,  KESZLER, Douglas, A. ,  TELECKY, Alan, J.

IPC: G03F7/16 ,  G03F7/00 ,  G03F1/22 ,  G03F7/031

Abstract: Organometallic precursors are described for the formation of high resolution lithography patterning coatings based on metal oxide hydroxide chemistry. The precursor compositions generally comprise ligands readily hydrolysable by water vapor or other OH source composition under modest conditions. The organometallic precursors generally comprise a radiation sensitive organo ligand to tin that can result in a coating that can be effective for high resolution patterning at relatively low radiation doses and is particularly useful for EUV patterning. The precursors compositions are readily processable under commercially suitable conditions. Solution phase processing with in situ hydrolysis or vapor based deposition can be used to form the coatings.

公开(公告)号：WO2017066319A8

公开(公告)日：2017-04-20

申请号：PCT/US2016/056637

申请日：2016-10-12

Applicant: INPRIA CORPORATION

Inventor： MEYERS, Stephen, T. ,  ANDERSON, Jeremy, T. ,  CARDINEAU, Brian, J. ,  EDSON, Joseph, B. ,  JIANG, Kai ,  KESZLER, Douglas, A. ,  TELECKY, Alan, J.

IPC: G03F7/16 ,  G03F7/00 ,  G03F1/22 ,  G03F7/031

Abstract: Organometallic precursors are described for the formation of high resolution lithography patterning coatings based on metal oxide hydroxide chemistry. The precursor compositions generally comprise ligands readily hydrolysable by water vapor or other OH source composition under modest conditions. The organometallic precursors generally comprise a radiation sensitive organo ligand to tin that can result in a coating that can be effective for high resolution patterning at relatively low radiation doses and is particularly useful for EUV patterning. The precursors compositions are readily processable under commercially suitable conditions. Solution phase processing with in situ hydrolysis or vapor based deposition can be used to form the coatings.

Abstract translation: 描述了有机金属前体用于形成基于金属氧化物氢氧化物化学的高分辨率光刻图案化涂层。 前体组合物通常包含在适度条件下易被水蒸气或其它OH源组合物水解的配体。 有机金属前体通常包含对锡的辐射敏感有机配体，其可产生对于在相对低的辐射剂量下高分辨率图案化有效的涂层，并且对于EUV图案化特别有用。 前体组合物在商业上合适的条件下易于加工。 采用原位水解或蒸汽沉积的溶液相处理可用于形成涂层。

公开(公告)号：WO2017066319A2

公开(公告)日：2017-04-20

申请号：PCT/US2016/056637

申请日：2016-10-12

Applicant: INPRIA CORPORATION

Inventor： MEYERS, Stephen, T. ,  ANDERSON, Jeremy, T. ,  CARDINEAU, Brian, J. ,  EDSON, Joseph, B. ,  JIANG, Kai ,  KESZLER, Douglas, A. ,  DARDI, Peter S.

IPC: G03F7/16 ,  G03F7/00 ,  G03F1/22 ,  G03F7/031

CPC classification number: G03F7/0042 ,  G03F7/162 ,  G03F7/2004 ,  G03F7/325 ,  G03F7/40

Abstract: Organometallic precursors are described for the formation of high resolution lithography patterning coatings based on metal oxide hydroxide chemistry. The precursor compositions generally comprise ligands readily hydrolysable by water vapor or other OH source composition under modest conditions. The organometallic precursors generally comprise a radiation sensitive organo ligand to tin that can result in a coating that can be effective for high resolution patterning at relatively low radiation doses and is particularly useful for EUV patterning. The precursors compositions are readily processable under commercially suitable conditions. Solution phase processing with in situ hydrolysis or vapor based deposition can be used to form the coatings.