Abstract:
A direct-write lithography apparatus includes a polarization selector stage configured to vary a polarization orientation angle of light from a light source, a focusing element configured to focus the light from the light source into a spot at a focal plane thereof, and a scanning stage configured to scan the spot in at least two dimensions along a surface of a polarization-sensitive recording medium that is arranged proximate to the focal plane such that neighboring scans substantially overlap. The polarization selector stage and the scanning stage are configured to be operated independently of one another. Related fabrication methods of and optical elements fabricated thereby are also discussed.
Abstract:
A beam steering apparatus includes a first beam steering stage and at least a second beam steering stage arranged in-line with the first beam steering stage. The first beam steering stage includes a first polarization grating comprising a uniaxial birefringent material having a first periodic director pattern, and the second beam steering stage includes a second polarization grating comprising a uniaxial birefringent material having a second periodic director pattern. In nonmechanical embodiments, a polarization selector may be arranged to provide a circularly polarized input beam incident on the first polarization grating. In mechanical embodiments, at least one of the first polarization grating and the second polarization grating may be operable to be independently rotated about an azimuth thereof. Related methods of operation are also discussed.