公开(公告)号：WO2017009166A1

公开(公告)日：2017-01-19

申请号：PCT/EP2016/066109

申请日：2016-07-07

Applicant: ASML NETHERLANDS B.V.

Inventor： BIJNEN, Franciscus, Godefridus, Casper ,  HULSEBOS, Edo, Maria

IPC: G03F9/00

CPC classification number: G03F9/7046 ,  G03F7/70258 ,  G03F7/705 ,  G03F9/7069 ,  G03F9/7073 ,  G03F9/7088

Abstract: A lithographic apparatus is described, the apparatus comprising: an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the apparatus further comprises an alignment system configured to perform, for one or more alignment marks that are present on the substrate: - a plurality of alignment mark position measurements for the alignment mark by applying a respective plurality of different alignment measurement parameters, thereby obtaining a plurality of measured alignment mark positions for the alignment mark; the apparatus further comprising a processing unit, the processing unit being configured to: - determine, for each of the plurality of alignment mark position measurements, a positional deviation as a difference between an expected alignment mark position and a measured alignment mark position, the measured alignment mark position being determined based on the respective alignment mark position measurement; - define a set of functions as possible causes for the positional deviations, the set of functions including a substrate deformation function representing a deformation of the substrate, and at least one mark deformation function representing a deformation of the one or more alignment marks; - generating a matrix equation PD = M*F whereby a vector PD comprising the positional deviations is set equal to a weighted combination, represented by a weight coefficient matrix M, of a vector F comprising the substrate deformation function and the at least one mark deformation function, whereby weight coefficients associated with the at least one mark deformation function vary depending on applied alignment measurement; - determining a value for the weight coefficients of the matrix M; - determining an inverse or pseudo-inverse matrix of the matrix M, thereby obtaining a value for the substrate deformation function as a weighted combination of the positional deviations. - applying the value of the substrate deformation function to perform an alignment of the target portion with the patterned radiation beam.

Abstract translation: 描述了光刻设备，该设备包括：照明系统，被配置为调节辐射束; 构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 构造成保持基板的基板台; 以及投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上，其中所述装置还包括对准系统，所述对准系统被配置为对存在于所述基板上的一个或多个对准标记执行： - 多个对准标记 通过施加相应的多个不同的对准测量参数来对准标记的位置测量，从而获得用于对准标记的多个测量的对准标记位置; 所述装置还包括处理单元，所述处理单元被配置为：对于所述多个对准标记位置测量中的每一个，确定作为预期对准标​​记位置和测量到的对准标记位置之间的差的位置偏差， 基于相应的对准标记位置测量来确定对准标记位置; - 定义一组函数作为位置偏差的可能原因，所述函数集合包括表示基板变形的基板变形函数以及表示所述一个或多个对准标记的变形的至少一个标记变形函数; - 产生矩阵方程PD = M * F，由此将包括位置偏差的矢量PD设置为等于由权重系数矩阵M表示的加权组合，该加权组合包括基底变形函数和至少一个标记变形 功能，由此与所述至少一个标记变形函数相关联的权重系数根据所施加的对准测量而变化; - 确定矩阵M的权重系数的值; - 确定矩阵M的逆矩阵或伪逆矩阵，从而获得基底变形函数的值作为位置偏差的加权组合。 - 施加基板变形函数的值以执行目标部分与图案化的辐射束的对准。