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    IMAGING SYSTEMS WITH PIXELATED SPATIAL LIGHT MODULATORS
    21.
    发明申请
    IMAGING SYSTEMS WITH PIXELATED SPATIAL LIGHT MODULATORS 审中-公开
    具有像素空间光调制器的成像系统

    公开(公告)号：WO2006102201A1

    公开(公告)日：2006-09-28

    申请号：PCT/US2006/009958

    申请日：2006-03-20

    Applicant: CDM OPTICS, INC. ,  CATHEY, Wade, Thomas, Jr. ,  DOWSKI, Edward, Raymond, Jr.

    Inventor： CATHEY, Wade, Thomas, Jr. ,  DOWSKI, Edward, Raymond, Jr.

    IPC: G02B27/46 ,  G02B27/50

    CPC classification number: G02B27/0025 ,  G01J3/0229 ,  G02B26/06

    Abstract: An imaging system includes a pixelated spatial light modulator ("SLM") to modify optical attributes (such as overall focus, wavefront coding, depth of field, and corrections for aberrations) of images. The SLM connects with a control unit that controls pixels of the SLM, and that asserts stored signal patterns to configure the SLM to change the optical attributes. The control unit may also include an image processor and image storage. An imaging method includes a control unit applying a signal pattern to a pixelated spatial light modulator in an imaging system to adjust an optical attribute. Another imaging method includes using a pixelated spatial light modulator to sequentially impart first and second optical tilts within an imaging system, capture an image using each optical tilt, and process the images to extract depth information such as, for example, a three dimensional depth map.

    Abstract translation: 成像系统包括像素化空间光调制器（“SLM”），用于修改图像的光学属性（诸如整体聚焦，波前编码，景深和像差校正）。 SLM与控制SLM的像素的控制单元连接，并且断言所存储的信号模式以配置SLM以改变光学属性。 控制单元还可以包括图像处理器和图像存储器。 一种成像方法包括：控制单元，将信号图案应用于成像系统中的像素化空间光调制器，以调整光学属性。 另一种成像方法包括使用像素化空间光调制器在成像系统内顺序地施加第一和第二光学倾斜，使用每个光学倾斜捕获图像，并处理图像以提取深度信息，例如三维深度图 。

    SYSTEMS AND METHODS FOR MINIMIZING ABERRATING EFFECTS IN IMAGING SYSTEMS
    22.
    发明申请
    SYSTEMS AND METHODS FOR MINIMIZING ABERRATING EFFECTS IN IMAGING SYSTEMS 审中-公开
    用于最小化成像系统中的影响效应的系统和方法

    公开(公告)号：WO2004090581A3

    公开(公告)日：2005-02-24

    申请号：PCT/US2004009743

    申请日：2004-03-31

    Applicant: CDM OPTICS INC ,  DOWSKI EDWARD RAYMOND JR ,  KUBELA KENNETH SCOTT ,  BARON ALAN EUGENE

    Inventor： DOWSKI EDWARD RAYMOND JR ,  KUBELA KENNETH SCOTT ,  BARON ALAN EUGENE

    IPC: G02B5/28 ,  G02B27/00 ,  G06K9/00

    CPC classification number: G02B27/0025 ,  G02B5/284 ,  G02B27/0012 ,  G06K9/00597

    Abstract: An imaging system for reducing aberrations from an intervening medium (52') and an associated method of use are provided. The system may be an optical or task-based optical imaging system including optics (102), such as a phase mask, for imaging a wavefront (55') of the system to an intermediate image and modifying phase of the wavefront such that an optical transfer function of the system is substantially invariant to focus-related aberrations from the medium. A detector (106) detects the intermediate image, which is further processed by a decoder (108), removing phase effects from the optics and forming a final image (110) substantially clear of the aberrations. Other systems may employ an encoder that codes wavefronts of acoustical waves propagating through a medium to make the wavefronts substantially invariant to acoustical aberrations from the medium. Imaging and decoding of the wavefronts reverse effects of the wavefront coding and produce sounds substantially free of the aberrations.

    Abstract translation: 提供了一种用于减少来自中间介质（52'）的像差的成像系统和相关联的使用方法。 该系统可以是包括光学或基于任务的光学成像系统，其包括诸如相位掩模的光学器件（102），用于将系统的波前（55'）成像到中间图像，并修改波阵面的相位，使得光学 系统的传递函数对于与介质的聚焦相关的像差基本上是不变的。 检测器（106）检测由解码器（108）进一步处理的中间图像，从光学元件去除相位效应并形成基本上不存在像差的最终图像（110）。 其他系统可以使用编码器，其对通过介质传播的声波的波前进行编码，以使波前对来自介质的声学像差基本上不变。 波前编码的波前反转效果的成像和解码，并产生基本上没有像差的声音。

    IMAGING SYSTEMS INCLUDING DISTRIBUTED PHASE MODIFICATION AND ASSOCIATED METHODS
    23.
    发明申请
    IMAGING SYSTEMS INCLUDING DISTRIBUTED PHASE MODIFICATION AND ASSOCIATED METHODS 审中-公开
    成像系统包括分布相位修正和相关方法

    公开(公告)号：WO2009124276A1

    公开(公告)日：2009-10-08

    申请号：PCT/US2009/039518

    申请日：2009-04-03

    Applicant: OMNIVISION CDM OPTICS, INC. ,  GALLAGHER, Dennis, J.

    Inventor： GALLAGHER, Dennis, J.

    IPC: G02B26/06 ,  G02B27/00

    CPC classification number: G02B27/0025 ,  G02B26/005

    Abstract: An imaging system for imaging a range of field points over on- and off- axis fields includes an image sensor for capturing image data, and first and second optical elements that are spaced apart and cooperate to image light at the image sensor. The first and second optical elements are configured to jointly modify phase of the light transmitted therethrough such that point-spread functions ("PSFs'") corresponding to the range field points are substantially uniform over on- and off-axis fields.

    Abstract translation: 一种成像系统，其用于在场外和离轴场上成像一系列场点，包括用于捕获图像数据的图像传感器，以及间隔开并配合以对图像传感器成像光的第一和第二光学元件。 第一和第二光学元件被配置为共同修改穿过其中的光的相位，使得对应于范围场点的点扩展函数（“PSF”“）在轴向和离轴场上基本均匀。

    TASK-BASED IMAGING SYSTEMS
    25.
    发明申请
    TASK-BASED IMAGING SYSTEMS 审中-公开
    任务型成像系统

    公开(公告)号：WO2008008084A2

    公开(公告)日：2008-01-17

    申请号：PCT/US2006036556

    申请日：2006-09-19

    Applicant: CDM OPTICS INC ,  SILVEIRA PAULO E X ,  NARAYANSWAMY RAMKUMAR ,  CORMACK ROBERT H ,  JOHNSON GREGORY E ,  DOWSKI EDWARD R JR

    Inventor： SILVEIRA PAULO E X ,  NARAYANSWAMY RAMKUMAR ,  CORMACK ROBERT H ,  JOHNSON GREGORY E ,  DOWSKI EDWARD R JR

    IPC: G02B13/00 ,  G02B15/00 ,  G02B15/04 ,  G02B27/00 ,  G02B27/46

    CPC classification number: G06K9/00597 ,  G02B26/06 ,  G02B27/0075

    Abstract: A task-based imaging system for obtaining data regarding a scene for use in a task includes an image data capturing arrangement for (a) imaging a wavefront of electromagnetic energy from the scene to an intermediate image over a range of spatial frequencies, (b) modifying phase of the wavefront, (c) detecting the intermediate image, and (d) generating image data over the range of spatial frequencies. The task-based imaging system also includes an image data processing arrangement for processing the image data and performing the task. The image data capturing and image data processing arrangements cooperate so that signal-to-noise ratio (SNR) of the task-based imaging system is greater than SNR of the task-based imaging system without phase modification of the wavefront over the range of spatial frequencies.

    Abstract translation: 一种用于获得关于用于任务的场景的数据的基于任务的成像系统，包括用于（a）在一定空间频率范围内将来自场景的电磁能的波前成像到中间图像的图像数据捕获装置，（b） 修改波前的相位，（c）检测中间图像，以及（d）在空间频率范围内生成图像数据。 基于任务的成像系统还包括用于处理图像数据并执行任务的图像数据处理装置。 图像数据捕获和图像数据处理装置协作，使得基于任务的成像系统的信噪比（SNR）大于基于任务的成像系统的SNR，而没有波阵面在空间范围上的相位修改 频率。

    LIGHT FOCUSING SYSTEMS WITH EXTENDED DEPTH OF FOCUS
    26.
    发明申请
    LIGHT FOCUSING SYSTEMS WITH EXTENDED DEPTH OF FOCUS 审中-公开
    光聚焦系统扩展深度聚焦

    公开(公告)号：WO2006121966A3

    公开(公告)日：2006-12-28

    申请号：PCT/US2006017609

    申请日：2006-05-08

    Applicant: CDM OPTICS INC ,  JOHNSON GREGORY E ,  CATHEY WADE THOMAS JR ,  DOWSKI EDWARD RAYMOND JR ,  WACH HANS BRANDON

    Inventor： JOHNSON GREGORY E ,  CATHEY WADE THOMAS JR ,  DOWSKI EDWARD RAYMOND JR ,  WACH HANS BRANDON

    IPC: G11B7/135

    CPC classification number: G11B7/1374 ,  G02B27/0025 ,  G02B27/0075 ,  G11B7/0045 ,  G11B7/005 ,  G11B7/13922 ,  G11B7/261

    Abstract: A system and method record data on an optical recording medium with a recording threshold. An illumination source creates an electromagnetic radiation beam. Optics, with a pupil phase function, image the beam onto the optical recording medium. The pupil phase function modifies the phase of the beam to form an aerial image at a point on a surface of the optical recording medium. A spot of the recording medium is modified at the point when the intensity of the aerial image is above the recording threshold, the intensity of the aerial image at the spot and area of the spot being substantially constant over an extended depth of focus.

    Abstract translation: 系统和方法在具有记录阈值的光学记录介质上记录数据。 照明源产生电磁辐射束。 具有光瞳相位功能的光学器件将光束成像到光学记录介质上。 瞳孔相位函数修改光束的相位以在光学记录介质的表面上的点处形成空间图像。 在空间图像的强度高于记录阈值的点处，记录介质的斑点被修改，斑点处的空间图像的强度和斑点的区域在扩展的聚焦深度上基本上是恒定的。

    SYSTEM AND METHOD FOR OPTIMIZING OPTICAL AND DIGITAL SYSTEM DESIGNS
    27.
    发明申请
    SYSTEM AND METHOD FOR OPTIMIZING OPTICAL AND DIGITAL SYSTEM DESIGNS 审中-公开
    用于优化光学和数字系统设计的系统和方法

    公开(公告)号：WO2005054927A2

    公开(公告)日：2005-06-16

    申请号：PCT/US2004/040218

    申请日：2004-12-01

    Applicant: CDM OPTICS, INC. ,  DOWSKI, Edward, Raymond, Jr. ,  JOHNSON, Gregory, E. ,  KUBELA, Kenneth, Scott ,  MACON, Kenneth, Ashley ,  RAUKER, Goran, M.

    Inventor： DOWSKI, Edward, Raymond, Jr. ,  JOHNSON, Gregory, E. ,  KUBELA, Kenneth, Scott ,  MACON, Kenneth, Ashley ,  RAUKER, Goran, M.

    IPC: G02B27/00

    CPC classification number: G02B27/0025 ,  G02B27/0012

    Abstract: A system, method and software product to optimize optical and/or digital system designs. An optical model of the optical system design is generated. A digital model of the digital system design is generated. Simulated output of the optical and digital models is analyzed to produce a score. The score is processed to determine whether the simulated output achieves one or more goals. One or more properties of at least one of the optical model and the digital model is modified if the goals are not achieved. The analyzing, processing and modifying is repeated until the goals are achieved, and an optimized optical system design and optimized digital system design are generated from the optical and digital models.

    Abstract translation: 用于优化光学和/或数字系统设计的系统，方法和软件产品。 产生光学系统设计的光学模型。 生成数字系统设计的数字模型。 对光学和数字模型的模拟输出进行分析以产生分数。 对得分进行处理以确定模拟输出是否达到一个或多个目标。 如果目标未实现，则修改光学模型和数字模型中的至少一个的一个或多个属性。 重复进行分析，处理和修改，直到实现目标，并从光学模型和数字模型生成优化的光学系统设计和优化的数字系统设计。

    ANTI-REFLECTIVE SURFACES AND METHODS FOR MAKING THE SAME
    28.
    发明申请
    ANTI-REFLECTIVE SURFACES AND METHODS FOR MAKING THE SAME 审中-公开
    防反射表面及其制造方法

    公开(公告)号：WO2010019946A4

    公开(公告)日：2010-06-17

    申请号：PCT/US2009054025

    申请日：2009-08-17

    Applicant: OMNIVISION CDM OPTICS INC ,  CARPENTER DERRICK T

    Inventor： CARPENTER DERRICK T

    IPC: H01L21/3065

    CPC classification number: G02B1/12

    Abstract: In an embodiment, a method of forming an anti-reflective surface includes providing conditions for a plasma, and exposing a surface of an organic-inorganic optical material to the plasma. A treated optical material formed thereby exhibits lower reflectivity relative to the material prior to the step of exposing, forming the anti-reflective surface. In an embodiment, a method of forming an anti -reflective surface includes depositing an etch mask on a surface of an optical material, providing plasma conditions for a plasma such that the plasma etches the optical material preferentially over the etch mask, and exposing the etch mask to the plasma using the plasma conditions to form a treated optical material having a plasma-affected zone. The optical material exhibits lower reflectivity relative to said optical material prior to the step of exposing, and forms the anti-reflective surface.

    Abstract translation: 在一个实施例中，形成抗反射表面的方法包括提供等离子体的条件，并将有机 - 无机光学材料的表面暴露于等离子体。 由此形成的经处理的光学材料在曝光步骤之前相对于材料显示较低的反射率，形成抗反射表面。 在一个实施例中，形成防反射表面的方法包括在光学材料的表面上沉积蚀刻掩模，为等离子体提供等离子体条件，使得等离子体优先在蚀刻掩模上蚀刻光学材料，并暴露蚀刻 使用等离子体条件对等离子体进行掩模以形成具有等离子体影响区域的经处理的光学材料。 在暴露步骤之前，光学材料相对于所述光学材料显示较低的反射率，并且形成抗反射表面。

    ANTI-REFLECTIVE SURFACES AND METHODS FOR MAKING THE SAME
    29.
    发明申请
    ANTI-REFLECTIVE SURFACES AND METHODS FOR MAKING THE SAME 审中-公开
    抗反射表面及其制备方法

    公开(公告)号：WO2010019946A2

    公开(公告)日：2010-02-18

    申请号：PCT/US2009/054025

    申请日：2009-08-17

    Applicant: OMNIVISION CDM OPTICS, INC. ,  CARPENTER, Derrick, T.

    Inventor： CARPENTER, Derrick, T.

    IPC: H01L21/3065

    CPC classification number: G02B1/12

    Abstract: In an embodiment, a method of forming an anti-reflective surface includes providing conditions for a plasma, and exposing a surface of an organic-inorganic optical material to the plasma. A treated optical material formed thereby exhibits lower reflectivity relative to the material prior to the step of exposing, forming the anti-reflective surface. In an embodiment, a method of forming an anti -reflective surface includes depositing an etch mask on a surface of an optical material, providing plasma conditions for a plasma such that the plasma etches the optical material preferentially over the etch mask, and exposing the etch mask to the plasma using the plasma conditions to form a treated optical material having a plasma-affected zone. The optical material exhibits lower reflectivity relative to said optical material prior to the step of exposing, and forms the anti-reflective surface.

    Abstract translation: 在一个实施例中，形成抗反射表面的方法包括为等离子体提供条件，并且将有机 - 无机光学材料的表面暴露于等离子体。 由此形成的经处理的光学材料相对于曝光步骤之前的材料表现出更低的反射率，从而形成抗反射表面。 在一个实施例中，形成减反射表面的方法包括在光学材料的表面上沉积蚀刻掩模，为等离子体提供等离子体条件，使得等离子体优先蚀刻光学材料在蚀刻掩模上方，并且暴露蚀刻 使用等离子体条件对等离子体进行掩模以形成具有等离子体影响区的经处理的光学材料。 在曝光步骤之前，光学材料相对于所述光学材料表现出更低的反射率，并且形成抗反射表面。

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