Abstract:
An electrodeless plasma lamp is described that employs acoustic resonance. The plasma lamp includes a metal enclosure having a conductive boundary forming a resonant structure, and a radio frequency (RF) feed to couple RF power from an RF power source into the resonant cavity. A bulb is received at least partially within an opening in the metal enclosure. The bulb contains a fill that forms a light emitting plasma when the power is coupled to the fill. The RF power source includes a controller to modulate the RF power to induce acoustic resonance in the plasma.
Abstract:
A multi-strike ballast to ignite an electrodless lamp is disclosed, and includes an inverter circuit, an output voltage detection circuit (OVDC), and an inverter shutdown circuit. The inverter circuit, upon activation, sends an ignition pulse to the electrodeless lamp. The inverter circuit shut downs upon receiving a deactivation signal, and activates upon receiving an activation signal, triggering another ignition pulse. The OVDC detects an output voltage across the lamp. The inverter shutdown circuit includes a multi-strike diac and receives the detected output voltage. The multi-strike diac breaks upon the output voltage reaching a predetermined level. In response, a deactivation signal is sent to the inverter circuit. The multi-strike diac turns off upon the output voltage falling below the predetermined level. In response, an activation signal is sent to the inverter circuit, triggering a further ignition pulse. The process repeats, providing multiple ignition pulses to the lamp.
Abstract:
The present disclosure relates to apparatuses and methods to control an electrodeless plasma light source. In various embodiments, an apparatus is provided that includes an electrodeless plasma lamp with a lamp driver circuit. The lamp driver circuit may include a voltage-controlled oscillator to provide radio frequency power to the electrodeless plasma lamp. A radio frequency power detector is coupled to an output of the voltage-controlled oscillator to detect a level of reflected power from the electrodeless plasma lamp. A microprocessor is configured to receive signals from the radio frequency power detector and control a frequency of the voltage-controlled oscillator to minimize the reflected power from the electrodeless plasma lamp.
Abstract:
An electrodeless plasma lamp is provided. The lamp includes a conductive enclosure including a dielectric material (e.g., air) and a bulb containing a fill to form a light emitting plasma. A radio frequency (RF) power source is coupled into the enclosure. At least one conductive applicator applies power from the enclosure to the bulb and at least one lumped inductive element is coupled between the RF feed and applicator. The lumped inductive element may be a helically wound coil. In an example embodiment, the lamp includes first and second lumped inductive elements. The first and second lumped inductive elements may extend from opposed end walls of the enclosure. The first lumped inductive element may be connected to a first conductive applicator located proximate a first end of the bulb and the second lumped inductive element may be connected to a second conductive applicator located proximate a second end of the bulb.
Abstract:
An electrodeless, microwave lamp (1) has a magnetron (2) as a microwave source and an excitable material lucent crucible (5) in whose excitable material a plasma is established. For coupling microwaves from the magnetron into the crucible, an air wave guide coupling circuit (4) is provided, with an output of the magnetron as an input at one quarter lambda from one end and an output at one quarter from the other end as an input to a connection to the crucible.
Abstract:
An electrodeless, microwave lamp (1) has a magnetron (2) as a microwave source and an excitable material lucent crucible (5) in whose excitable material a plasma is established. For coupling microwaves from the magnetron into the crucible, an air wave guide coupling circuit (4) is provided, with an output of the magnetron as an input at one quarter lambda from one end and an output at one quarter from the other end as an input to a connection to the crucible.
Abstract:
An electrodeless plasma lamp and a method of controlling operation of a plasma lamp are provided. The plasma lamp may a power source to provide radio frequency (RF) power and a lamp body to receive the RF power from a feed. The lamp body may comprise a dielectric material having a dielectric constant greater than 2 and bulb is provided that contains a fill that forms a plasma that emits light when at least a portion of the RF power is coupled to the fill. A light guide directs light from the bulb to a photosensor that is shielded from light output from a front side of the lamp body. The lamp includes a drive circuit to control operation of the lamp based on a level of light detected by the photosensor.
Abstract:
Die Erfindung betrifft ein Beleuchtungssystem aus einer DBD-Lampe (DBD) und einem elektronischen Vorschaltgerät mit einem Rechteckwandler (S1 - S4) und einer Ladeinduktivität (L1, L2).
Abstract:
A planar light-source driving circuit may include: a voltage source applying a DC voltage; an inductor supplying current depending on the DC voltage applied by the voltage source; a transformer having a primary side connected to the inductor and a secondary side connected to a planar light source, the transformer applying a pulse voltage to the planar light source using the current supplied from the inductor; and first and second switches respectively connected between both ends of the primary side of the transformer and a ground, the first and second switches controlling the current supplied to the transformer by on/off switching operations.
Abstract:
Bei einer Plasmaversorgungseinrichtung (10, 10') zur Erzeugung einer Ausgangsleistung > 500 W bei einer im Wesentlichen konstanten Grundfrequenz > 3 MHz und zur Leistungsversorgung eines Plasmaprozesses, an welchen die erzeugte Ausgangsleistung geliefert wird und von welchem reflektierte Leistung zumindest bei Fehlanpassung an die Plasmaversorgungseinrichtung (10, 10') zurückgeleitet wird, mit zumindest einem an eine DC-Stromversorgung (13, 14, 13', 14') angeschlossenen Inverter (11, 12), der zumindest ein schaltendes Element (11.1, 11.2, 12.1, 12.2) aufweist, und mit einem Ausgangsnetzwerk (15, 15'), wobei eine über eine Schaltung zur Erzeugung eines veränderbaren Magnetfeldes (613, 713) einstellbare Induktivität (21a, 21b, 29) mit einem Magnetfeldverstärkungselement (41, 42, 55, 610, 715) vorgesehen ist und das veränderbaren Magnetfeld (613, 713) das Magnetfeldverstärkungselement (41, 42, 55, 610, 715) beeinflusst.