EXPOSURE PROCESS AND DEVICE
    1.
    发明申请
    EXPOSURE PROCESS AND DEVICE 审中-公开
    方法和设备曝光

    公开(公告)号:WO1996034745A2

    公开(公告)日:1996-11-07

    申请号:PCT/DE1996000755

    申请日:1996-05-02

    Inventor: LINOTYPE-HELL AG

    CPC classification number: H04N1/0635 G03F7/20 H04N1/0607 H04N1/23

    Abstract: The invention relates to a process and device for exposing imaging material. A light beam (2) generated in a light source (1) is modulated linewise during an exposure time in a video modulator (5) and deflected over the imaging material (9) by means of a light beam deflector (7). During a returm time following the exposure time the video modulator (5) is deactivated. To present back-reflections, between the light source (1) and the video modulator (5) there is an optical isolator (4) which is switched on during the exposure time by gate pulses. In oder to maintain a constant operating temperature of the optical isolator (4) during the exposure and return times, the optical isolator (4) is swiched on linewise by additional gate pulses (GI) during a compensation time within the return time, during which the optical isolator (4) heats up. The optical isloator (4) is controlled in such a way that the sum of the lenghts of the exposure time and the compensation time is fairly constant within each line.

    Abstract translation: 本发明涉及一种方法和用于记录材料的曝光的装置。 成的光源(1)由线产生的光束(2),线,各亮度调制在记录材料上,在视频调制器(5)的曝光周期和偏转通过光光束偏转装置(7)(9)。 在随后的视频调制器(5)的每个曝光周期期间的再循环被去激活。 为了避免背反射,光隔离器(4)被布置在所述光源(1)和由选通脉冲期间的曝光时间段接通的视频调制器(5)之间。 为了保持在曝光和反馈周期的光隔离器(4)的一个恒定的工作温度,所述光学隔离器(4)期间,位于所述反馈周期补偿期间内线通过由附加栅极脉冲(GI)线接通,其中,所述光隔离器 (4)加热。 光隔离器(4)的控制是这样的,每行内,曝光时间和消除期间的时间序列盘区的总和是大约恒定的。

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