公开(公告)号：WO2008022259A8

公开(公告)日：2009-08-20

申请号：PCT/US2007076098

申请日：2007-08-16

Applicant: IBM ,  COMEAU JOSEPH K V ,  KATSNELSON MARINA M ,  TIERSCH MATTHEW T ,  WHITE ERIC J

Inventor： COMEAU JOSEPH K V ,  KATSNELSON MARINA M ,  TIERSCH MATTHEW T ,  WHITE ERIC J

IPC: C09K13/00

CPC classification number: C09K3/1463 ,  C09G1/02 ,  C09G1/04

Abstract: A solution for forming a polishing slurry, the polishing slurry and related methods are disclosed. The solution for forming a polishing slurry may include 1 H- benzotriazole (BTA) dissolved in an ionic surfactant such as a sodium alkyl sulfate solution, and perhaps a polyacrylic acid (PAA) solution. The solution can be filtered and used in a polishing slurry. This approach to solubilizing BTA results in a high BTA concentration in a polishing slurry without addition of foreign components to the slurry or increased safety hazard. In addition, the solution is easier to ship because it is very stable (e.g., can be frozen and thawed) and has less volume compared to conventional approaches. Further, the polishing slurry performance is vastly improved due to the removal of particles that can cause scratching.

Abstract translation: 公开了一种用于形成抛光浆料，抛光浆料和相关方法的溶液。 用于形成抛光浆料的溶液可以包括溶解在诸如烷基硫酸钠溶液的离子表面活性剂中的1 H-苯并三唑（BTA）和可能的聚丙烯酸（PAA）溶液。 该溶液可以过滤并用于抛光浆料中。 这种溶解BTA的方法导致抛光浆料中的高BTA浓度，而不会向浆料中添加外来成分或增加安全隐患。 此外，由于该溶液非常稳定（例如可以冷冻和解冻）并且与常规方法相比具有较少的体积，因此该溶液更易于运输。 此外，由于去除可能引起划伤的颗粒，抛光浆料性能大大提高。

公开(公告)号：WO2008022259A1

公开(公告)日：2008-02-21

申请号：PCT/US2007/076098

申请日：2007-08-16

Applicant: INTERNATIONAL BUSINESS MACHINES ,  COMEAU, Joseph, K.V. ,  KATSNELSON, Marina, M. ,  TIERSCH, Matthew, T. ,  WHITE, Eric, J.

Inventor： COMEAU, Joseph, K.V. ,  KATSNELSON, Marina, M. ,  TIERSCH, Matthew, T. ,  WHITE, Eric, J.

IPC: C09K13/00

CPC classification number: C09K3/1463 ,  C09G1/02 ,  C09G1/04

Abstract: A solution for forming a polishing slurry, the polishing slurry and related methods are disclosed. The solution for forming a polishing slurry may include 1 H- benzotriazole (BTA) dissolved in an ionic surfactant such as a sodium alkyl sulfate solution, and perhaps a polyacrylic acid (PAA) solution. The solution can be filtered and used in a polishing slurry. This approach to solubilizing BTA results in a high BTA concentration in a polishing slurry without addition of foreign components to the slurry or increased safety hazard. In addition, the solution is easier to ship because it is very stable (e.g., can be frozen and thawed) and has less volume compared to conventional approaches. Further, the polishing slurry performance is vastly improved due to the removal of particles that can cause scratching.

Abstract translation: 公开了用于形成抛光浆料，抛光浆料和相关方法的溶液。 用于形成抛光浆料的溶液可以包括溶解在离子表面活性剂如烷基硫酸钠溶液中的1 H-苯并三唑（BTA）和可能的聚丙烯酸（PAA）溶液。 该溶液可以过滤并用于抛光浆料中。 这种溶解BTA的方法导致抛光浆料中的高BTA浓度，而不会向浆料中添加外来成分或增加安全隐患。 此外，由于该溶液非常稳定（例如，可以冷冻和解冻）并且与常规方法相比具有较少的体积，因此该溶液更易于运输。 此外，由于去除可引起划伤的颗粒，抛光浆料性能大大提高。