公开(公告)号：WO2011129565A3

公开(公告)日：2011-12-22

申请号：PCT/KR2011002530

申请日：2011-04-11

Applicant: HEE SUNG METAL LTD ,  YOON WON-KYU ,  YANG SEUNG-HO ,  HONG GIL-SU ,  KIM HONG SIK ,  KANG DONG HAN

Inventor： YOON WON-KYU ,  YANG SEUNG-HO ,  HONG GIL-SU ,  KIM HONG SIK ,  KANG DONG HAN

IPC: B22F9/14 ,  B22F1/00 ,  C22B34/24 ,  C22C27/02

CPC classification number: B22F9/14 ,  B22F2009/001 ,  C22C27/02 ,  Y02P10/24

Abstract: The present invention relates to a method for producing tantalum (Ta) powder from a waste tantalum (Ta) target using eutectic alloys. The method comprises the following steps: removing contaminants from the surface of a waste tantalum (Ta) target by means of a chemical or physical method; weighing the waste tantalum (Ta) target from which contaminants are removed and a eutectic reaction element, and feeding the waste tantalum target and the eutectic reaction element at a desirable ratio into the interior of plasma equipment; reducing the pressure inside the plasma equipment, and injecting reaction gas and applying electric power to the interior of the plasma equipment so as to form a low-power plasma and produce tantalum (Ta) eutectic alloys; applying a high-power plasma to the tantalum (Ta) eutectic alloys to produce an ultra-fine tantalum (Ta) eutectic alloy powder; heat-treating the thus-produced tantalum (Ta) eutectic alloy powder; and removing the eutectic reaction element from the heat-treated tantalum (Ta) eutectic alloy powder using a chemical method to produce high-purity ultra-fine tantalum (Ta) powder.

Abstract translation: 本发明涉及使用共晶合金从废钽（Ta）靶产生钽（Ta）粉末的方法。 该方法包括以下步骤：通过化学或物理方法从废钽（Ta）靶的表面去除污染物; 称量除去污染物的废钽（Ta）靶和共晶反应元件，并以期望的比例将废钽靶和共晶反应元件供给到等离子体设备的内部; 降低等离子体设备内的压力，注入反应气体并向等离子体设备内部施加电力，形成低功率等离子体并生产钽（Ta）共晶合金; 将高功率等离子体施加到钽（Ta）共晶合金以产生超细钽（Ta）共晶合金粉末; 热处理由此生产的钽（Ta）共晶合金粉末; 并使用化学方法从热处理的钽（Ta）共晶合金粉末中除去共晶反应元件以产生高纯度超细钽（Ta）粉末。

公开(公告)号：WO2005120684A1

公开(公告)日：2005-12-22

申请号：PCT/KR2005/001715

申请日：2005-06-08

Applicant: KOREA INSTITUTE OF MACHINERY AND MATERIALS ,  CHA, Min-Suk ,  SONG, Young-Hoon ,  LEE, Jae-Ok ,  KIM, Kwan-Tae ,  KIM, Seock-Joon ,  KIM, Hong-Sik

Inventor： CHA, Min-Suk ,  SONG, Young-Hoon ,  LEE, Jae-Ok ,  KIM, Kwan-Tae ,  KIM, Seock-Joon ,  KIM, Hong-Sik

IPC: B01D53/32

CPC classification number: B01D53/32 ,  B01D2257/404 ,  B01D2257/70 ,  B01D2257/90 ,  B01D2259/818

Abstract: The present invention is related to a cold plasma reactor for low pressure drop and low energy density using a dielectric barrier discharge and a method for fabricating the same, the reactor being used for (1) treating various noxious gases such as a nitrogen oxide(NOx), a volatile organic compounds(VOCs) , and a stinking material, (2) generating ozone and ozone water, and (3) generating a chemically reactive species having high chemical reactivity in order to treate a surface of a metal, a ceramic and a polymer material. The cold plasma reactor comprises a cylindrical electrode rod, the cylindricalelectrode rod comprising a dielectric cylinder with a hole formed in the center thereof and a metal rod inserted into the hole, or a metal paste applied on the inner surface of the hole, and a both side structure formed by installing numbers of the cylindrical electrode rods spaced apart with a regular distance in parallel. In the both side structure, metal leads of neighboring electrode rods are positioned opposite to each other to prevent arc discharge from being generated and to generate stable plasma. The cold plasma reactor for low pressure drop and low energy density according to the present invention is applied to a system which (1) minimizes pressure drop of a flow occurred in a conventional art, (2) consumes low plasma generating power for handling mass flow and prevents oxidation and corrosion of the metal electrode, and (3) is not influenced by a direction of a flow.

Abstract translation: 本发明涉及一种使用介电阻挡放电的低压降和低能量密度的冷等离子体反应器及其制造方法，该反应器用于（1）处理各种有害气体如氮氧化物（NOx ），挥发性有机化合物（VOC）和臭味物质，（2）产生臭氧和臭氧水，和（3）产生具有高化学反应性的化学反应性物质以便处理金属，陶瓷和 聚合物材料。 冷等离子体反应器包括圆柱形电极棒，圆柱形电极棒包括在其中心形成有孔的介电圆柱体和插入孔中的金属棒或施加在孔内表面上的金属膏， 通过安装数个平行间隔开的​​规定距离的圆柱形电极棒形成的侧面结构。 在两侧结构中，相邻电极棒的金属引线彼此相对设置，以防止产生电弧放电并产生稳定的等离子体。 根据本发明的用于低压降和低能量密度的冷等离子体反应器应用于（1）使传统技术中发生的流量的压降最小化的系统，（2）消耗用于处理质量流量的低等离子体发生功率 并防止金属电极的氧化和腐蚀，（3）不受流动方向的影响。