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    PLASMA SOURCE DESIGN
    1.
    发明申请
    PLASMA SOURCE DESIGN 审中-公开
    等离子源设计

    公开(公告)号：WO2011062755A3

    公开(公告)日：2011-09-15

    申请号：PCT/US2010055077

    申请日：2010-11-02

    Applicant: APPLIED MATERIALS INC ,  LUBOMIRSKY DMITRY ,  YANG JANG-GYOO ,  MILLER MATTHEW L ,  PINSON JAY D III ,  CHUC KIEN N ,  VENKATARMAN SHANKAR

    Inventor： LUBOMIRSKY DMITRY ,  YANG JANG-GYOO ,  MILLER MATTHEW L ,  PINSON JAY D III ,  CHUC KIEN N ,  VENKATARMAN SHANKAR

    IPC: H05H1/46 ,  H01L21/205 ,  H01L21/3065

    CPC classification number: H01J37/3211 ,  H01J37/32357

    Abstract: Embodiments of the present invention generally provide a plasma source apparatus, and method of using the same, that is able to generate radicals and/or gas ions in a plasma generation region that is symmetrically positioned around a magnetic core element by use of an electromagnetic energy source. In general, the orientation and shape of the plasma generation region and magnetic core allows for the effective and uniform coupling of the delivered electromagnetic energy to a gas disposed in the plasma generation region. In general, the improved characteristics of the plasma formed in the plasma generation region is able to improve deposition, etching and/or cleaning processes performed on a substrate or a portion of a processing chamber that is disposed downstream of the plasma generation region.

    Abstract translation: 本发明的实施例通常提供一种等离子体源装置及其使用方法，其能够通过使用电磁能量在对称地定位在磁芯元件周围的等离子体产生区域中产生自由基和/或气体离子 资源。 通常，等离子体生成区域和磁芯的取向和形状允许将所递送的电磁能量有效且均匀地耦合到设置在等离子体生成区域中的气体。 通常，在等离子体生成区域中形成的等离子体的改善的特性能够改善在设置在等离子体生成区域下游的衬底或处理室的一部分上执行的沉积，蚀刻和/或清洁处理。

    PLASMA SOURCE DESIGN
    2.
    发明申请
    PLASMA SOURCE DESIGN 审中-公开
    等离子体源设计

    公开(公告)号：WO2011062755A2

    公开(公告)日：2011-05-26

    申请号：PCT/US2010/055077

    申请日：2010-11-02

    Applicant: APPLIED MATERIALS, INC. ,  LUBOMIRSKY, Dmitry ,  YANG, Jang-Gyoo ,  MILLER, Matthew L. ,  PINSON, Jay D., III ,  CHUC, Kien N. ,  VENKATARMAN, Shankar

    Inventor： LUBOMIRSKY, Dmitry ,  YANG, Jang-Gyoo ,  MILLER, Matthew L. ,  PINSON, Jay D., III ,  CHUC, Kien N. ,  VENKATARMAN, Shankar

    IPC: H05H1/46 ,  H01L21/3065 ,  H01L21/205

    CPC classification number: H01J37/3211 ,  H01J37/32357

    Abstract: Embodiments of the present invention generally provide a plasma source apparatus, and method of using the same, that is able to generate radicals and/or gas ions in a plasma generation region that is symmetrically positioned around a magnetic core element by use of an electromagnetic energy source. In general, the orientation and shape of the plasma generation region and magnetic core allows for the effective and uniform coupling of the delivered electromagnetic energy to a gas disposed in the plasma generation region. In general, the improved characteristics of the plasma formed in the plasma generation region is able to improve deposition, etching and/or cleaning processes performed on a substrate or a portion of a processing chamber that is disposed downstream of the plasma generation region.

    Abstract translation: 本发明的实施例通常提供一种等离子体源装置及其使用方法，其能够通过使用电磁能量在等离子体产生区域内产生自由基和/或气体离子，所述等离子体产生区域围绕磁芯元件对称地定位 资源。 通常，等离子体产生区域和磁芯的取向和形状允许将输送的电磁能量有效均匀地耦合到设置在等离子体产生区域中的气体。 通常，等离子体产生区域中形成的等离子体的改进的特性能够改善在设置在等离子体产生区域下游的衬底或处理室的一部分上进行的沉积，蚀刻和/或清洁过程。

    PLASMA SOURCE DESIGN
    4.
    发明申请
    PLASMA SOURCE DESIGN 审中-公开
    等离子源设计

    公开(公告)号：WO2011063146A2

    公开(公告)日：2011-05-26

    申请号：PCT/US2010/057274

    申请日：2010-11-18

    Applicant: APPLIED MATERIALS, INC. ,  LUBOMIRSKY, Dmitry ,  YANG, Jang-Gyoo ,  MILLER, Matthew L. ,  PINSON, Jay D., III ,  CHUC, Kien N.

    Inventor： LUBOMIRSKY, Dmitry ,  YANG, Jang-Gyoo ,  MILLER, Matthew L. ,  PINSON, Jay D., III ,  CHUC, Kien N.

    IPC: H05H1/46 ,  H01L21/3065

    CPC classification number: H01J37/3211 ,  H01J37/32357

    Abstract: Embodiments of the present invention generally provide a plasma source apparatus, and method of using the same, that is able to generate radicals and/or gas ions in a plasma generation region that is symmetrically positioned around a magnetic core element by use of an electromagnetic energy source. In general, the orientation and shape of the plasma generation region and magnetic core allows for the effective and uniform coupling of the delivered electromagnetic energy to a gas disposed in the plasma generation region. In general, the improved characteristics of the plasma formed in the plasma generation region is able to improve deposition, etching and/or cleaning processes performed on a substrate or a portion of a processing chamber that is disposed downstream of the plasma generation region.

    Abstract translation: 本发明的实施例通常提供一种等离子体源装置及其使用方法，其能够在等离子体产生区中产生自由基和/或气体离子，该等离子体产生区对称地位于磁体 核心元件通过使用电磁能源。 通常，等离子体生成区域和磁芯的取向和形状允许将所递送的电磁能量有效且均匀地耦合到设置在等离子体生成区域中的气体。 通常，在等离子体生成区域中形成的等离子体的改善的特性能够改善在布置在等离子体生成区域下游的衬底或处理室的一部分上执行的沉积，蚀刻和/或清洁过程。 p>

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