公开(公告)号：WO2002098189A2

公开(公告)日：2002-12-05

申请号：PCT/EP2002/003628

申请日：2002-04-02

Applicant: LAMBDA PHYSIK AG ,  SCHRIEVER, Guido ,  REBHAN, Ulrich

Inventor： SCHRIEVER, Guido ,  REBHAN, Ulrich

IPC: H05G2/00

CPC classification number: H05G2/003 ,  B03C3/383 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70916

Abstract: An EUV photon source includes a plasma chamber filled with a gas mixture, multiple electrodes within the plasma chamber defining a plasma region and a central axis, a power supply circuit connected to the electrodes for delivering a main pulse to the electrodes for energizing the plasma around the central axis to produce an EUV beam output along the central axis, and a preionizer for ionizing the gas mixture in preparing to form a dense plasma around the central axis upon application of the main pulse from the power supply circuit to the electrodes. The EUV source preferably includes an ionizing unit and precipitator for collecting contaminant particulates from the output beam path. A set of baffles may be disposed along the beam path outside of the pinch region to diffuse gaseous and contaminant particulate flow emanating from the pinch region and to absorb or reflect acoustic waves emanating from the pinch region away from the pinch region. A clipping aperture, preferably formed of ceramic and/or Al2O3, for at least partially defining an acceptance angle of the EUV beam. The power supply circuit may generates the main pulse and a relatively low energy prepulse for homogenizing the preionized plasma prior to the main pulse. A multi-layer EUV mirror is preferably disposed opposite a beam output side of the pinch region for reflecting radiation along the central axis for output along the beam path of the EUV beam. The EUV mirror preferably has a curved contour for substantially collimating or focusing the reflected radiation. In particular, the EUV mirror may preferably have a hyperbolic contour.

Abstract translation: EUV光子源包括填充有气体混合物的等离子体室，等离子体室内限定等离子体区域和中心轴线的多个电极，连接到电极的电源电路，用于将主脉冲传送到电极以激励等离子体周围 沿着中心轴产生EUV射束的中心轴线，以及用于使气体混合物离子化的准分子离子化器，用于在将电脉冲从电源电路施加到电极上时在中心轴周围形成致密等离子体。 EUV源优选地包括用于从输出光束路径收集污染物微粒的电离单元和沉淀器。 可以沿着夹紧区域外的光束路径布置一组挡板以扩散从夹持区域发出的气体和污染物颗粒流，并吸收或反射从夹紧区域远离夹点区域发出的声波。 剪切孔，优选地由陶瓷和/或Al 2 O 3形成，用于至少部分地限定EUV束的接受角。 电源电路可以产生主脉冲和相对较低能量的前脉冲，用于在主脉冲之前均化预电离的等离子体。 多层EUV反射镜优选地设置成与夹持区域的光束输出侧相对，用于沿着中心轴反射辐射，以沿着EUV光束的光束路径输出。 EUV镜子优选地具有弯曲轮廓，用于基本上准直或聚焦反射的辐射。 特别地，EUV镜可以优选地具有双曲线轮廓。

公开(公告)号：WO02098189A3

公开(公告)日：2003-03-20

申请号：PCT/EP0203628

申请日：2002-04-02

Applicant: LAMBDA PHYSIK AG ,  SCHRIEVER GUIDO ,  REBHAN ULRICH

Inventor： SCHRIEVER GUIDO ,  REBHAN ULRICH

IPC: B03C3/38 ,  G03F7/20 ,  H05G2/00

CPC classification number: H05G2/003 ,  B03C3/383 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70916

Abstract: An EUV photon source includes a plasma chamber filled with a gas mixture, multiple electrodes within the plasma chamber defining a plasma region and a central axis, a power supply circuit connected to the electrodes for delivering a main pulse to the electrodes for energizing the plasma around the central axis to produce an EUV beam output along the central axis, and a preionizer for ionizing the gas mixture in preparing to form a dense plasma around the central axis upon application of the main pulse from the power supply circuit to the electrodes. The EUV source preferably includes an ionizing unit and precipitator for collecting contaminant particulates from the output beam path. A set of baffles may be disposed along the beam path outside of the pinch region to diffuse gaseous and contaminant particulate flow emanating from the pinch region and to absorb or reflect acoustic waves emanating from the pinch region away from the pinch region. A clipping aperture, preferably formed of ceramic and/or Al2O3, for at least partially defining an acceptance angle of the EUV beam. The power supply circuit may generates the main pulse and a relatively low energy prepulse for homogenizing the preionized plasma prior to the main pulse. A multi-layer EUV mirror is preferably disposed opposite a beam output side of the pinch region for reflecting radiation along the central axis for output along the beam path of the EUV beam. The EUV mirror preferably has a curved contour for substantially collimating or focusing the reflected radiation. In particular, the EUV mirror may preferably have a hyperbolic contour.

Abstract translation: EUV光子源包括填充有气体混合物的等离子体室，等离子体室内限定等离子体区域和中心轴线的多个电极，连接到电极的电源电路，用于将主脉冲传送到电极以激励等离子体周围 沿着中心轴产生EUV射束的中心轴线，以及用于使气体混合物离子化的准分子离子化器，用于在将电脉冲从电源电路施加到电极上时在中心轴周围形成致密等离子体。 EUV源优选地包括用于从输出光束路径收集污染物微粒的电离单元和沉淀器。 可以沿着夹紧区域外的光束路径布置一组挡板以扩散从夹持区域发出的气体和污染物颗粒流，并吸收或反射从夹紧区域远离夹点区域发出的声波。 剪切孔，优选地由陶瓷和/或Al 2 O 3形成，用于至少部分地限定EUV束的接受角。 电源电路可以产生主脉冲和相对较低能量的前脉冲，用于在主脉冲之前均化预电离等离子体。 多层EUV反射镜优选地设置成与夹持区域的光束输出侧相对，用于沿着中心轴反射辐射，以沿着EUV光束的光束路径输出。 EUV镜子优选地具有弯曲轮廓，用于基本上准直或聚焦反射的辐射。 特别地，EUV镜可以优选地具有双曲线轮廓。

公开(公告)号：WO2003017005A1

公开(公告)日：2003-02-27

申请号：PCT/EP2002/009073

申请日：2002-08-13

Applicant: LAMBDA PHYSIK AG ,  SCHRIEVER, Guido

Inventor： SCHRIEVER, Guido

IPC: G03F7/20

CPC classification number: B82Y10/00 ,  G01J1/429 ,  G03F7/70033 ,  G03F7/70558 ,  H01L31/02161 ,  H01L31/02162 ,  H01L31/02325 ,  H01L31/1037 ,  H01L31/108

Abstract: A detector for use with an EUV photon source emitting around 11-15 nm includes at least one multilayer mirror for reflecting the beam along an optical path including a detector element, a filter for reducing the bandwidth of the beam, and the detector element. The detector element preferably comprises Si pn diodes with doped dead region and zero surface recombination or a PtSi-nSi barrier for increasing the long term stability of the detector.

Abstract translation: 用于发射约11-15nm的EUV光子源的检测器包括至少一个用于沿着包括检测器元件的光路反射光束的多层反射镜，用于减小光束带宽的滤光器和检测器元件。 检测器元件优选地包括具有掺杂死区和零表面复合的Si pn二极管或用于增加检测器的长期稳定性的PtSi-nSi势垒。