公开(公告)号：WO2008051432A3

公开(公告)日：2009-04-09

申请号：PCT/US2007022219

申请日：2007-10-18

Applicant: HARVARD COLLEGE ,  LAHAV MICHAL ,  WINKLEMAN ADAM ,  NAROVLYANSKY MAX ,  PEREZ-CASTILLEJOS RAQUEL ,  WEISS EMILY A ,  RODRIGUEZ LEONARD N J ,  WHITESIDES GEORGE M

Inventor： LAHAV MICHAL ,  WINKLEMAN ADAM ,  NAROVLYANSKY MAX ,  PEREZ-CASTILLEJOS RAQUEL ,  WEISS EMILY A ,  RODRIGUEZ LEONARD N J ,  WHITESIDES GEORGE M

IPC: G03F7/00

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  Y10T428/24479

Abstract: In one aspect, methods of patterning of thin films of an ionotropic polymer (e.g., poly(acrylic acid)) are provided. These processes can create micron or sub-micron-scale patterns of ionotropic polymers such as cation crosslinked poly(acrylic acid) (CCL- PAA). In one embodiment, patterning may be performed within microfluidic channels by flowing a solution of crosslinking agent (e.g., metal cations such as Ag+, Ca2+, Pd2+, Al3+, La3+, and Ti4+) that can crosslink a portion of an ionotropic polymer in contact with the solution. In another embodiment, methods of patterning ionotropic polymers involve photolithography. Upon patterning a positive photoresist (e.g., diazonaphthoquinone- novolac resin) on a film of CCL-PAA, the exposed regions of CCL-PAA can be etched by an aqueous solution. Advantageously, the patterned, crosslinked polymer may also serve as both a reactant and a matrix for subsequent chemistry. For example, in some embodiments, the initial crosslinking cation can be exchanged for a second cation that could not be patterned photolithographically. Patterned films of CCL-PAA can also be used to host and template the reduction of metallic cations to metallic nanoparticles, and to fabricate porous, low-k dielectric substrates.

Abstract translation: 一方面，提供了离子型聚合物（例如聚（丙烯酸））的薄膜图案化方法。 这些方法可以产生离子型聚合物如阳离子交联的聚（丙烯酸）（CCL-PAA）的微米级或亚微米级的图案。 在一个实施方案中，可以在微流体通道内通过使交联剂（例如金属阳离子如Ag +，Ca 2+，Pd 2+，Al 3+，La 3+和Ti 4+）的溶液流过微流体通道，所述溶液可以将部分离子型聚合物与 解决方案。 在另一个实施方案中，构图离子型聚合物的方法涉及光刻。 在CCL-PAA膜上形成正性光致抗蚀剂（例如重氮萘酚 - 酚醛清漆树脂）之后，CCL-PAA的曝光区域可以通过水溶液进行蚀刻。 有利地，图案化的交联聚合物也可以用作反应物和用于后续化学的基质。 例如，在一些实施方案中，可以将初始交联阳离子交换为不能光刻图案化的第二阳离子。 CCL-PAA的图案化膜也可用于将金属阳离子还原为金属纳米颗粒，并制备多孔，低k电介质基底。

公开(公告)号：WO2008051432A2

公开(公告)日：2008-05-02

申请号：PCT/US2007/022219

申请日：2007-10-18

Applicant: PRESIDENT AND FELLOWS OF HARVARD COLLEGE ,  LAHAV, Michal ,  WINKLEMAN, Adam ,  NAROVLYANSKY, Max ,  PEREZ-CASTILLEJOS, Raquel ,  WEISS, Emily, A. ,  RODRIGUEZ, Leonard, N. J. ,  WHITESIDES, George, M.

Inventor： LAHAV, Michal ,  WINKLEMAN, Adam ,  NAROVLYANSKY, Max ,  PEREZ-CASTILLEJOS, Raquel ,  WEISS, Emily, A. ,  RODRIGUEZ, Leonard, N. J. ,  WHITESIDES, George, M.

IPC: G03F7/00

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  Y10T428/24479

Abstract: In one aspect, methods of patterning of thin films of an ionotropic polymer (e.g., poly(acrylic acid)) are provided. These processes can create micron or sub-micron-scale patterns of ionotropic polymers such as cation crosslinked poly(acrylic acid) (CCL- PAA). In one embodiment, patterning may be performed within microfluidic channels by flowing a solution of crosslinking agent (e.g., metal cations such as Ag + , Ca 2+ , Pd 2+ , Al 3+ , La 3+ , and Ti 4+ ) that can crosslink a portion of an ionotropic polymer in contact with the solution. In another embodiment, methods of patterning ionotropic polymers involve photolithography. Upon patterning a positive photoresist (e.g., diazonaphthoquinone- novolac resin) on a film of CCL-PAA, the exposed regions of CCL-PAA can be etched by an aqueous solution. Advantageously, the patterned, crosslinked polymer may also serve as both a reactant and a matrix for subsequent chemistry. For example, in some embodiments, the initial crosslinking cation can be exchanged for a second cation that could not be patterned photolithographically. Patterned films of CCL-PAA can also be used to host and template the reduction of metallic cations to metallic nanoparticles, and to fabricate porous, low-k dielectric substrates.

Abstract translation: 一方面，提供了离子型聚合物（例如聚（丙烯酸））的薄膜图案化方法。 这些方法可以产生离子型聚合物如阳离子交联的聚（丙烯酸）（CCL-PAA）的微米级或亚微米级的图案。 在一个实施方案中，可以通过使交联剂溶液（例如，金属阳离子如Ag 2+，Ca 2+，Pd 2+， 2+，3+，3+，3+，和3++++++++++++++++++++++++++++++++++++++++++++++++++++++++++++++++++++++++++++++++++++++++++ 与溶液接触。 在另一个实施方案中，构图离子型聚合物的方法涉及光刻。 在CCL-PAA膜上形成正性光致抗蚀剂（例如重氮萘酚 - 酚醛清漆树脂）之后，CCL-PAA的曝光区域可以通过水溶液进行蚀刻。 有利地，图案化的交联聚合物也可以用作反应物和用于后续化学的基质。 例如，在一些实施方案中，可以将初始交联阳离子交换为不能光刻图案化的第二阳离子。 CCL-PAA的图案化膜也可用于将金属阳离子还原为金属纳米颗粒，并制备多孔，低k电介质基底。