公开(公告)号：WO2021091698A1

公开(公告)日：2021-05-14

申请号：PCT/US2020/056802

申请日：2020-10-22

Applicant: APPLIED MATERIALS, INC.

Inventor： WRIGHT, Graham ,  ALVARADO, Daniel ,  PATEL, Shreyansh, P. ,  TIEGER, Daniel, R.

IPC: H01J37/34 ,  H01J37/08

Abstract: An ion source with an insertable target holder for holding a solid dopant material is disclosed. The insertable target holder includes a hollow interior into which the solid dopant material is disposed. The target holder has a porous surface at a first end, through which vapors from the solid dopant material may enter the arc chamber. The porous surface inhibits the passage of liquid or molten dopant material into the arc chamber. The target holder is also constructed such that it may be refilled with dopant material when the dopant material within the hollow interior has been consumed. The porous surface may be a portion of a perforated crucible, a portion of a perforated retention cap, or a porous insert.

公开(公告)号：WO2019118120A1

公开(公告)日：2019-06-20

申请号：PCT/US2018/061000

申请日：2018-11-14

Applicant: APPLIED MATERIALS, INC.

Inventor： BECKER, Klaus ,  ALVARADO, Daniel ,  ST. PETER, Michael ,  WRIGHT, Graham

IPC: H01J27/14 ,  H01J37/08

Abstract: An ion source with a crucible is disclosed. In some embodiments, the crucible is disposed in one of the ends of the ions source, opposite the cathode. In other embodiments, the crucible is disposed in one of the side walls. A feed material, which may be in solid form is disposed in the crucible. In certain embodiments, the feed material is sputtered by ions and electrons in the plasma. In other embodiments, the feed material is heated so that it vaporizes. The ion source may be oriented so that the crucible is disposed in the lowest wall so that gravity retains the feed material in the crucible.

公开(公告)号：WO2022271347A1

公开(公告)日：2022-12-29

申请号：PCT/US2022/029784

申请日：2022-05-18

Applicant: APPLIED MATERIALS, INC.

Inventor： WRIGHT, Graham ,  WILSON, Eric Donald ,  ALVARADO, Daniel ,  LINDBERG, Robert C. ,  MULLIN, Jacob

IPC: H01J27/08 ,  H01J27/02 ,  H01J37/08 ,  H01J27/022 ,  H01J27/14

Abstract: A crucible that exploits the observation that molten metal tends to flow toward the hottest regions is disclosed. The crucible includes an interior in which dopant material may be disposed. The crucible has a pathway leading from the interior toward an aperture, wherein the temperature is continuously increasing along the pathway. The aperture may be disposed in or near the interior of the arc chamber of an ion source. The liquid metal flows along the pathway toward the arc chamber, where it is vaporized and then ionized. By controlling the flow rate of the pathway, spillage may be reduced. In another embodiment, an inverted crucible is disclosed. The inverted crucible comprises a closed end in communication with the interior of the ion source, so that the closed end is the hottest region of the crucible. An opening is disposed on a different wall to allow vapor to exit the crucible.

公开(公告)号：WO2022235399A1

公开(公告)日：2022-11-10

申请号：PCT/US2022/024407

申请日：2022-04-12

Applicant: APPLIED MATERIALS, INC.

Inventor： WRIGHT, Graham ,  ALVARADO, Daniel ,  WILSON, Eric Donald ,  LINDBERG, Robert

IPC: H01J37/08 ,  H01J27/02 ,  H01J37/317

Abstract: A system and method for extending the life of a cathode and repeller in an IHC ion source is disclosed. The system monitors the health of the cathode by operating using a known set of parameters and measuring the bias power used to generate the desired extracted beam current or the desired current from the arc voltage power supply. Based on the measured bias power, the system may determine whether the cathode is becoming too thin, and may take a corrective action. This corrective action may be to alert the operator; to operate the IHC ion source using a predetermined set of parameters; or to change the dilution used within the IHC source. By performing these actions, the life of the cathode may be more than doubled.

公开(公告)号：WO2021071634A1

公开(公告)日：2021-04-15

申请号：PCT/US2020/050857

申请日：2020-09-15

Applicant: APPLIED MATERIALS, INC.

Inventor： PATEL, Shreyansh P. ,  WRIGHT, Graham ,  ALVARADO, Daniel ,  TIEGER, Daniel R. ,  GORI, Brian S. ,  BOGIAGES, William R., Jr. ,  OSWALD, Benjamin ,  CHANEY, Craig R.

IPC: H01J27/02 ,  H01J27/08

Abstract: An ion source with a target holder for holding a solid dopant material is disclosed. The ion source comprises a thermocouple disposed proximate the target holder to monitor the temperature of the solid dopant material. In certain embodiments, a controller uses this temperature information to vary one or more parameters of the ion source, such as arc voltage, cathode bias voltage, extracted beam current, or the position of the target holder within the arc chamber. Various embodiments showing the connections between the controller and the thermocouple are shown. Further, embodiments showing various placement of the thermocouple on the target holder are also presented.