VAPOUR NOZZLE FOR PVD
    1.
    发明申请

    公开(公告)号:WO2023062410A1

    公开(公告)日:2023-04-20

    申请号:PCT/IB2021/059432

    申请日:2021-10-14

    Applicant: ARCELORMITTAL

    Abstract: The invention relates to a vapour jet coater for depositing, on a running substrate, coatings formed from metal or metal alloy, said vapour jet coater comprising successively : - a repartition chamber, configured to be connectable to an evaporation pipe, and - a vapour outlet orifice, connected to said repartition chamber and able to eject a metal alloy vapour along a main ejection plan and a main ejection direction, comprising successively i. a converging section, ii. a diverging section.

    VAPOUR NOZZLE FOR PVD
    2.
    发明申请

    公开(公告)号:WO2023062454A1

    公开(公告)日:2023-04-20

    申请号:PCT/IB2022/058332

    申请日:2022-09-05

    Applicant: ARCELORMITTAL

    Abstract: The invention relates to a vapour jet coater for depositing, on a running substrate, coatings formed from metal or metal alloy, said vapour jet coater comprising successively : - a repartition chamber, configured to be connectable to an evaporation pipe, and - a vapour outlet orifice, connected to said repartition chamber and able to eject a metal alloy vapour along a main ejection plan and a main ejection direction, comprising successively i. a converging section, ii. a diverging section.

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