公开(公告)号：WO2021063663A1

公开(公告)日：2021-04-08

申请号：PCT/EP2020/075658

申请日：2020-09-14

Applicant: ASML HOLDING N.V.

Inventor： ALSAQQA, Ali ,  ADAMS, Joshua ,  LI, Bin

IPC: G03F9/00

Abstract: An apparatus for and a method of determining alignment of a substrate in which the intensity of a radiation source illuminating an alignment mark is varied in accordance with whether an element in the system for converting an analog signal into a digital signal is in a mode in which it is sampling the signal or in a mode in which it is converting the signal and so not sensitive changes in the signal, thus to reduce the amount of exposure of the substrate or system optical components to the illuminating radiation.