公开(公告)号：WO2016030090A1

公开(公告)日：2016-03-03

申请号：PCT/EP2015/066872

申请日：2015-07-23

Applicant: ASML NETHERLANDS B.V.

Inventor： AUER, Frank ,  COSIJNS, Suzanne ,  JEUNINK, Andre, Bernardus ,  KOENEN, Willem ,  PRIL, Wouter ,  VERHAAR, Boudewijn ,  VAN DER PASCH, Engelbertus ,  ADRIAENS, Johannes ,  EUSSEN, Emiel

IPC: G01D5/244 ,  G01D18/00

CPC classification number: G01D5/24452 ,  G01D18/00

Abstract: The invention relates to an encoder system calibration method, wherein the encoder system is configured to measure a position of an object relative to a reference in a first direction, said encoder system comprising: - a first encoder head cooperating with a first grating to provide a first signal; - a second encoder head cooperating with a second grating to provide a second signal; wherein the method comprises the following steps: a) positioning the object in a predetermined position; b) capturing the first signal when the object is in said predetermined position; c) capturing the second signal when the object is in said predetermined position; and d) calibrating the second grating based on the captured first signal and the respective captured second signal, and wherein steps a) to d) are performed after arranging the encoder system in the object positioning system.

Abstract translation: 本发明涉及一种编码器系统校准方法，其中所述编码器系统被配置为在第一方向上测量对象相对于参考的位置，所述编码器系统包括： - 第一编码器头，与第一光栅协作以提供 第一个信号; - 与第二光栅协作以提供第二信号的第二编码器头; 其中所述方法包括以下步骤：a）将所述物体定位在预定位置; b）当物体处于所述预定位置时捕获第一信号; c）当所述物体处于所述预定位置时捕获所述第二信号; 以及d）基于所捕获的第一信号和相应的捕获的第二信号来校准第二光栅，并且其中在将编码器系统布置在对象定位系统中之后执行步骤a）至d）。

公开(公告)号：WO2014063995A1

公开(公告)日：2014-05-01

申请号：PCT/EP2013/071780

申请日：2013-10-17

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN DER PASCH, Engelbertus ,  JANSEN, Albert ,  JEUNINK, Andre ,  ADRIAENS, Johannes ,  AUER, Frank ,  BROOMANS, Peterjan ,  COSIJNS, Suzanne ,  KOENEN, Willem ,  SMIT, Sebastiaan ,  VERMUNT, Joris Wilhelmus Henricus

IPC: G03F7/20

CPC classification number: G03F7/70775 ,  G03F7/70516 ,  G03F7/70716

Abstract: A positioning system for positioning a substrate (150, 160) in a lithographic apparatus, the positioning system comprising a first object table (210) moveable in an operating area; a second object table (310) moveable in the operating area; a first position measurement system (100.1 - 100.3, 200.1, 200.2, 300.1, 300.2) configured to provide an incremental position measurement of the first object table and the second object table relative to a reference when in the operating area, wherein the first position measurement is configured to provide an absolute position measurement of the first object table relative to the reference; a second position measurement system (330.1, 330.2) configured to provide an absolute position measurement of the first object table relative to the second object table, and wherein the first position measurement system is further configured to provide an absolute position measurement of the second object table relative to the reference based on the absolute position measurement of the first object table relative to the reference and on the absolute position measurement of the first object relative to the second object.

Abstract translation: 一种用于将基板（150,160）定位在光刻设备中的定位系统，所述定位系统包括可在操作区域中移动的第一物体台（210） 在操作区域中可移动的第二对象表（310） 第一位置测量系统（100.1-100.3,200.1,200.2,300.1,300.2），其被配置为当在所述操作区域中提供所述第一对象表和所述第二对象表相对于参考的增量位置测量，其中所述第一位置测量 被配置为提供相对于参考的第一对象表的绝对位置测量; 第二位置测量系统（330.1,330.2），被配置为相对于所述第二对象表提供所述第一对象表的绝对位置测量，并且其中所述第一位置测量系统还被配置为提供所述第二对象表的绝对位置测量 相对于基于相对于参考的第一对象表的绝对位置测量和相对于第二对象的第一对象的绝对位置测量的参考。

公开(公告)号：WO2020173652A1

公开(公告)日：2020-09-03

申请号：PCT/EP2020/052244

申请日：2020-01-30

Applicant: ASML NETHERLANDS B.V.

Inventor： JANSEN, Maarten, Jozef ,  AUER, Frank

IPC: G03F7/20

Abstract: The invention provides a stage system comprising a stage (ST) which is movable in respect of a reference structure. One of the stage and the reference structure comprises a reflective surface (REFS). An optical position sensor (I F1) is arranged at the other one of the stage and the reference structure and is configured to determine a position of the reflective surface relative to the optical position sensor. An optical shape sensor (IF2) is configured to determine a shape of the reflective surface. The stage system further comprises a position measurement controller configured to derive a stage position of the stage from the position of the reflective surface relative to the optical position sensor and from the shape of the reflective surface as determined by the optical shape sensor.