公开(公告)号：WO2023057175A1

公开(公告)日：2023-04-13

申请号：PCT/EP2022/075331

申请日：2022-09-13

Applicant: ASML NETHERLANDS B.V.

Inventor： JANSSEN, Franciscus, Johannes, Joseph ,  ARLEMARK, Erik, Johan ,  GRZELKA, Jacek

IPC: G03F7/20 ,  G03F7/70808 ,  G03F7/70841 ,  G03F7/70875 ,  G03F7/70916 ,  G03F7/70933

Abstract: A chamber for a projection system of a lithographic apparatus is described, the chamber comprising: - an opening configured to enable, during use, a patterned radiation beam to be projected onto a substrate that is arranged outside the chamber; - a conduit having an outlet in the aperture, the conduit being configured to deliver a gas to the opening for providing a gas seal of the opening; - a filter arranged in a flow path of the gas, at or near the outlet, the filter being configured to thermally condition the gas.